http://www.cnr.it/ontology/cnr/individuo/prodotto/ID193512
Surface processing of materials with fluorocarbon fed atmospheric pressure dielectric barrier discharges (Articolo in rivista)
- Type
- Label
- Surface processing of materials with fluorocarbon fed atmospheric pressure dielectric barrier discharges (Articolo in rivista) (literal)
- Anno
- 2012-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1179/1743294411Y.0000000043 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Fiorenza Fanelli (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Dipartimento di Chimica, Universita` degli Studi di Bari Aldo Moro - IMIP
CNR, via Orabona 4, Bari 70126, Italy (literal)
- Titolo
- Surface processing of materials with fluorocarbon fed atmospheric pressure dielectric barrier discharges (literal)
- Abstract
- Nowadays, atmospheric pressure cold plasmas, particularly in dielectric barrier discharge (DBD)
configuration, attract significant interest in the field of surface processing of materials.
Fluorocarbon containing DBDs have also been studied, but the state of the art in this field is at
its early stages, especially if compared to low pressure plasmas, which have been widely and
successfully employed for the etching of inorganic and organic materials, for the deposition of
fluoropolymers as well as for the treatment of synthetic and natural polymers. This contribution will
provide an overview of our recent studies on fluorocarbon containing DBDs and will present
results on the deposition of fluoropolymers concerning the tuning of the chemical composition of
the deposits, the etching-deposition competition and the influence of feed gas contaminants (i.e.
air and water vapour). (literal)
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- Autore CNR
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