Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography (Articolo in rivista) (literal)

Anno

• 2012-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.mee.2012.07.042 (literal)

Alternative label

• Haatainen, T., Mäkelä, T., Schleunitz, A., Grenci, G., Tormen, M. (2012)
  Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography
  in Microelectronic engineering
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Haatainen, T., Mäkelä, T., Schleunitz, A., Grenci, G., Tormen, M. (literal)

Pagina inizio

• 180 (literal)

Pagina fine

• 183 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 98 (literal)

Rivista

• Microelectronic engineering (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 4 (literal)

Note

• Scopus (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• VTT, Espoo FI-02150, Finland Paul Scherrer Institute, Laboratory for Micro and Nanotechnology, CH-5232 Villigen PSI, Switzerland Istituto Officina Dei Materiali, IOM-CNR, Laboratorio TASC Area Science Park, I-34149 Trieste, Italy (literal)

Titolo

• Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography (literal)

Abstract

• In this work, we fabricated hybrid micron-scale blazed grating structures on top of linear nanoscale gratings by superimposing thermal nanoimprint process. A poly(methyl methacrylate) (PMMA) substrate was at first pre-patterned with a nanoscale binary line grating by thermal NIL. The second imprint was added into the linear surface-gratings by sequential thermal imprinting using a stamp with micron-scale blazed gratings. The rotation controlled patterning was realized by Step and Stamp Imprint Lithography (SSIL) using NPS300 nanoimprinting stepper with a rotation imprint head with ability to control X/Y positioning and angular orientation of the stamp. In this paper, we demonstrate the potential of the hybrid imprint process for fabrication of e.g. hybrid bio devices or optical elements with arbitrary orientation. © 2012 Elsevier B.V. All rights reserved. (literal)

Autore CNR

• MASSIMO TORMEN (Unità di personale interno)
• GIANLUCA GRENCI (Unità di personale interno)

Insieme di parole chiave

• Keywords of "Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• MASSIMO TORMEN (Unità di personale interno)
• GIANLUCA GRENCI (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Microelectronic engineering (Rivista)

Insieme di parole chiave di

• Keywords of "Integration of rotated 3-D structures into pre-patterned PMMA substrate using step & stamp nanoimprint lithography" (Insieme di parole chiave)