Nano- and microstructuring of graphene using UV-NIL (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Nano- and microstructuring of graphene using UV-NIL (Articolo in rivista) (literal)

Anno

• 2012-01-01T00:00:00+01:00 (literal)

Alternative label

• Iris Bergmair, Wolfgang Hackl, Maria Losurdo, Christian Helgert, Goran Isic, Michael Rohn, Milka M Jakovljevic, Thomas Mueller, Maria Michela Giangregorio, Ernst-Bernhard Kley, Thomas Fromherz, Rados Gajic, Thomas Pertsch, Giovanni Bruno, Michael Muehlberger (2012)
  Nano- and microstructuring of graphene using UV-NIL
  in Nanotechnology (Bristol. Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Iris Bergmair, Wolfgang Hackl, Maria Losurdo, Christian Helgert, Goran Isic, Michael Rohn, Milka M Jakovljevic, Thomas Mueller, Maria Michela Giangregorio, Ernst-Bernhard Kley, Thomas Fromherz, Rados Gajic, Thomas Pertsch, Giovanni Bruno, Michael Muehlberger (literal)

Pagina inizio

• 335301 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 23 (literal)

Rivista

• Nanotechnology (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 6 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• - Functional Surfaces and Nanostructures, PROFACTOR GmbH, Im Stadtgut A2, A-4407 Steyr-Gleink, Austria - Institute of Inorganic Methodologies and of Plasmas-CNR, Via Orabona 4, I-70126 Bari, Italy - Institute of Applied Physics, Abbe Center of Photonics, Friedrich-Schiller-Universit¨at Jena, Max Wien Platz 1, D-07743 Jena, Germany - Nonlinear Physics Centre, Research School of Physics and Engineering, Australian National University, Canberra, Australia - Institute of Physics, Center for Solid State Physics and New Materials, Belgrade University, Pregrevica 118, 11080 Belgrade, Serbia - Institute of Photonics, Vienna University of Technology, Gußhausstraße 25-29, A-1040 Wien, Vienna, Austria - Institute of Semiconductor and Solid State Physics, Johannes Kepler University of Linz, Altenbergerstraße 69, A-4040 Linz, Austria (literal)

Titolo

• Nano- and microstructuring of graphene using UV-NIL (literal)

Abstract

• In this work we demonstrate for the first time the micro- and nanostructuring of graphene by means of UV-nanoimprint lithography. Exfoliated graphene on SiO2 substrates, as well as graphene deposited by chemical vapor deposition (CVD) on polycrystalline nickel and copper, and transferred CVD graphene on dielectric substrates, were used to demonstrate that our technique is suitable for large-area patterning (2 ? 2 cm2) of graphene on various types of substrates. The demonstrated fabrication procedure of micrometer as well as nanometer-sized graphene structures with feature sizes down to 20 nm by a wafer-scale process opens up an avenue for the low-cost and high-throughput manufacturing of graphene-based optical and electronic applications. The processed graphene films show electron mobilities of up to 4:6 ? 103 cm2 V-1 s-1, which confirms them to exhibit state-of-the-art electronic quality with respect to the current literature. (literal)

Prodotto di

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR

• MARIA MICHELA GIANGREGORIO (Persona)
• MARIA LOSURDO (Unità di personale interno)
• GIOVANNI BRUNO (Unità di personale interno)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR di

• GIOVANNI BRUNO (Unità di personale interno)
• MARIA LOSURDO (Unità di personale interno)
• MARIA MICHELA GIANGREGORIO (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Nanotechnology (Rivista)