http://www.cnr.it/ontology/cnr/individuo/prodotto/ID191618
The Rh oxide ultrathin film on Rh(100): An x-ray photoelectron diffraction study (Articolo in rivista)
- Type
- Label
- The Rh oxide ultrathin film on Rh(100): An x-ray photoelectron diffraction study (Articolo in rivista) (literal)
- Anno
- 2010-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.3509777 (literal)
- Alternative label
Rong Rong Zhan, Erik Vesselli, Alessandro Baraldi, Silvano Lizzit, Giovanni Comelli (2010)
The Rh oxide ultrathin film on Rh(100): An x-ray photoelectron diffraction study
in THE JOURNAL OF CHEMICAL PHYSICS; American Institute of Physics, Melville [NY] (Stati Uniti d'America)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Rong Rong Zhan, Erik Vesselli, Alessandro Baraldi, Silvano Lizzit, Giovanni Comelli (literal)
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- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://jcp.aip.org/resource/1/jcpsa6/v133/i21/p214701_s1 (literal)
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- ISI Web of Science (WOS) (literal)
- Scopus (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Physics Department and Center of Excellence for Nanostructured Materials, University of Trieste,
via A. Valerio 2, 34127--Trieste, Italy
IOM CNR, Laboratorio TASC, AREA Science Park, SS 14 km 163.5, 34149 Trieste, Italy
Sincrotrone Trieste SCpA, AREA Science Park, SS 14 km 163.5, 34149 Trieste, Italy (literal)
- Titolo
- The Rh oxide ultrathin film on Rh(100): An x-ray photoelectron diffraction study (literal)
- Abstract
- The surface and interface structure of the RhO2 ultrathin film grown on Rh(100) is investigated by
means of x-ray photoelectron diffraction. Experimental and simulated one- and two-dimensional angular
distribution intensities of the O1s and Rh3d5/2 chemically shifted core levels are quantitatively
analyzed. The previously proposed O-Rh-O trilayer model is independently confirmed. A rippled
buckling of the metal surface is observed at the oxide-metal interface, with a mean interfacial Rh-O
distance which is 0.2 Å larger with respect to previous findings. The link between the local atomic rearrangement
and the overall geometric and electronic properties of the oxide is discussed on the basis
of a thorough comparison with the corresponding RhO2 rutile structure. (literal)
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