Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition (Articolo in rivista) (literal)

Anno

• 2012-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1002/pssc.201100105 (literal)

Alternative label

• E. Cappelli, D. M. Trucchi, S. Orlando, A. Bellucci, S. Kaciulis, A. Mezzi (2012)
  Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition
  in Physica status solidi. C, Current topics in solid state physics (Internet); Wiley-VCH Verlag Gmbh, Weinheim (Germania)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• E. Cappelli, D. M. Trucchi, S. Orlando, A. Bellucci, S. Kaciulis, A. Mezzi (literal)

Pagina inizio

• 1053 (literal)

Pagina fine

• 1056 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://onlinelibrary.wiley.com/doi/10.1002/pssc.201100105/abstract (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 9 (literal)

Rivista

• Physica status solidi. C, Current topics in solid state physics (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 4 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 3-4 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR-IMIP CNR-IMIP PZ CNR-ISMN (literal)

Titolo

• Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition (literal)

Abstract

• Aluminium nitride (AlN) thin films were deposited using a reactive ArF excimer pulsed laser ablation (PLD) of a pure Al target in a N-2 plasma atmosphere, generated by a RF source, onto p-Si < 100 > substrates, at increasing substrate temperatures. A radio-frequency (13.56 MHz RF) apparatus was introduced with the specific aim of increasing the fraction of excited and/or ionized nitrogen species and, ultimately, to increase its reactivity toward the aluminum atoms, expanding in the plume, and the formation of AlN. We studied the dependence and correlation of structural, compositional and electric properties with the specific experimental conditions. The chemical composition of films, determined by XPS spectroscopy, revealed a trend of increased N-2 reactivity, uptake and nitride formation, with deposition temperature. Electrical resistivity, measured by the four-point-probe method, has been found to be also strongly dependent on the substrate temperature and nitrogen incorporation. A possible explanation of the correlation of surface conductivity with chemical composition is suggested and discussed. (literal)

Editore

• Wiley-VCH Verlag Gmbh (Editore)

Prodotto di

• INTERAZIONE LASER E MATERIA (MD.P03.030.002) (Modulo)
• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)
• Materiali e Dispositivi a base Carbonio (MD.P05.022.001) (Modulo)
• Istituto di Nanotecnologia (NANOTEC) (Istituto)

Autore CNR

• ALESSIO MEZZI (Unità di personale interno)
• EMILIA CAPPELLI (Unità di personale interno)
• ALESSANDRO BELLUCCI (Persona)
• DANIELE MARIA TRUCCHI (Persona)
• STEFANO ORLANDO (Unità di personale interno)
• SAULIUS KACIULIS (Persona)

Insieme di parole chiave

• Keywords of "Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)
• INTERAZIONE LASER E MATERIA (MD.P03.030.002) (Modulo)
• Materiali e Dispositivi a base Carbonio (MD.P05.022.001) (Modulo)

Autore CNR di

• EMILIA CAPPELLI (Unità di personale interno)
• DANIELE MARIA TRUCCHI (Persona)
• STEFANO ORLANDO (Unità di personale interno)
• ALESSANDRO BELLUCCI (Persona)
• SAULIUS KACIULIS (Persona)
• ALESSIO MEZZI (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Physica status solidi. C, Current topics in solid state physics (Rivista)

Editore di

• Wiley-VCH Verlag Gmbh (Editore)

Insieme di parole chiave di

• Keywords of "Influence of process conditions on chemical composition and electronic properties of AlN thin films prepared by ArF reactive pulsed laser deposition" (Insieme di parole chiave)