http://www.cnr.it/ontology/cnr/individuo/prodotto/ID191094
Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation (Articolo in rivista)
- Type
- Label
- Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1103/PhysRevB.84.085331 (literal)
- Alternative label
J. Alvarez, J.-P. Kleider, R. Trotta, A. Polimeni, M. Capizzi, F. Martelli , L. Mariucci, S. Rubini (2011)
Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation
in Physical review. B, Condensed matter and materials physics (CD-ROM)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- J. Alvarez, J.-P. Kleider, R. Trotta, A. Polimeni, M. Capizzi, F. Martelli , L. Mariucci, S. Rubini (literal)
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- Pagina fine
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- Rivista
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- Note
- Scopus (literal)
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Laboratoire de Ge´nie E´lectrique de Paris, CNRS UMR8507, SUPELEC
Dipartimento di Fisica, Sapienza Universit`a di Roma
IMM-CNR
IOM-CNR (literal)
- Titolo
- Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation (literal)
- Abstract
- The electrical properties of untreated and hydrogen-irradiated GaAs1-xNx are investigated by conductive-probe
atomic force microscopy (CP-AFM). After hydrogen irradiation, the resistance R of GaAs1-xNx increases by
more than three orders of magnitude while that of a N-free GaAs reference slightly decreases. Thermal annealing
at 550 oC of H-irradiated GaAs1-xNx restores the pristine electrical properties of the as-grown sample thus
demonstrating that this phenomenon is fully reversible. These effects are attributed to the nitrogen-hydrogen
complexes that passivate N in GaAs1-xNx (thus restoring the energy gap of N-free GaAs) and, moreover, reduce
the carrier scattering time by more than one order of magnitude. This opens up a route to the fabrication of planar
conductive/resistive/conductive heterostructures with submicrometer spatial resolution, which is also reported
here. (literal)
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