Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation (Articolo in rivista)

Type
Label
  • Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation (Articolo in rivista) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1103/PhysRevB.84.085331 (literal)
Alternative label
  • J. Alvarez, J.-P. Kleider, R. Trotta, A. Polimeni, M. Capizzi, F. Martelli , L. Mariucci, S. Rubini (2011)
    Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation
    in Physical review. B, Condensed matter and materials physics (CD-ROM)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • J. Alvarez, J.-P. Kleider, R. Trotta, A. Polimeni, M. Capizzi, F. Martelli , L. Mariucci, S. Rubini (literal)
Pagina inizio
  • 085331-1 (literal)
Pagina fine
  • 085331-5 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 84 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 5 (literal)
Note
  • Scopus (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Laboratoire de Ge´nie E´lectrique de Paris, CNRS UMR8507, SUPELEC Dipartimento di Fisica, Sapienza Universit`a di Roma IMM-CNR IOM-CNR (literal)
Titolo
  • Giant and reversible enhancement of the electrical resistance of GaAs1-xNx by hydrogen irradiation (literal)
Abstract
  • The electrical properties of untreated and hydrogen-irradiated GaAs1-xNx are investigated by conductive-probe atomic force microscopy (CP-AFM). After hydrogen irradiation, the resistance R of GaAs1-xNx increases by more than three orders of magnitude while that of a N-free GaAs reference slightly decreases. Thermal annealing at 550 oC of H-irradiated GaAs1-xNx restores the pristine electrical properties of the as-grown sample thus demonstrating that this phenomenon is fully reversible. These effects are attributed to the nitrogen-hydrogen complexes that passivate N in GaAs1-xNx (thus restoring the energy gap of N-free GaAs) and, moreover, reduce the carrier scattering time by more than one order of magnitude. This opens up a route to the fabrication of planar conductive/resistive/conductive heterostructures with submicrometer spatial resolution, which is also reported here. (literal)
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