Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures (Articolo in rivista)

Type
Label
  • Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures (Articolo in rivista) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.3633260 (literal)
Alternative label
  • Sarah Goler 1,2, Vincenzo Piazza 2, Stefano Roddaro 1, Vittorio Pellegrini 1, Fabio Beltram 1,2, and Pasqualantonio Pingue 1 (2011)
    Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures
    in Journal of applied physics; The American Physical Society, College Park, MD 20740-3844 (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Sarah Goler 1,2, Vincenzo Piazza 2, Stefano Roddaro 1, Vittorio Pellegrini 1, Fabio Beltram 1,2, and Pasqualantonio Pingue 1 (literal)
Pagina inizio
  • 064308 (literal)
Pagina fine
  • 064313 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://jap.aip.org/resource/1/japiau/v110/i6/p064308_s1 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 110 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 Laboratorio NEST - Scuola Normale Superiore, and Istituto Nanoscienze - CNR, Piazza San Silvestro 12, I-56127 Pisa, Italy 1 Center for Nanotechnology Innovation @ NEST, Istituto Italiano di Tecnologia, Piazza San Silvestro 12, 56127 Pisa, Italy (literal)
Titolo
  • Self-assembly and electron-beam-induced direct etching of suspended graphene nanostructures (literal)
Abstract
  • We report on suspended single-layer graphene deposition by a transfer-printing approach based on polydimethylsiloxane stamps. The transfer printing method allows the exfoliation of graphite flakes from a bulk graphite sample and their residue-free deposition on a silicon dioxide substrate. This deposition system creates a \"blistered\" graphene surface due to strain induced by the transfer process itself. Single-layer-graphene deposition and its blistering on the substrate are demonstrated by a combination of Raman spectroscopy, scanning electron microscopy, and atomic-force microscopy measurements. Finally, we demonstrate that blister-like suspended graphene are self-supporting single-layer structures and can be flattened by employing a spatially resolved direct-lithography technique based on electron-beam induced etching. (literal)
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