http://www.cnr.it/ontology/cnr/individuo/prodotto/ID190163
Competition between Polar and Nonpolar Growth of MgO Thin Films on Au(111) (Articolo in rivista)
- Type
- Label
- Competition between Polar and Nonpolar Growth of MgO Thin Films on Au(111) (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Alternative label
S. Benedetti, N. Nilius, P. Torelli, G. Renaud, H.-J. Freund, S. Valeri (2011)
Competition between Polar and Nonpolar Growth of MgO Thin Films on Au(111)
in Journal of physical chemistry. C
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- S. Benedetti, N. Nilius, P. Torelli, G. Renaud, H.-J. Freund, S. Valeri (literal)
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- Rivista
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- +Dip. Fisica, UniversitĂ di Modena e Reggio Emilia, Via Campi 213A, I-41125 Modena, Italy
?Centro S3, Istituto Nanoscienze?CNR, Via Campi 213A, I-41125 Modena, Italy
§Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany
||CEA-Grenoble, Institut Nanoscience et Cryog?enie/SP2M/NRS, 17 rue de Martyrs, 38054 Grenoble, France (literal)
- Titolo
- Competition between Polar and Nonpolar Growth of MgO Thin Films on Au(111) (literal)
- Abstract
- We report a growth study of MgO thin films on an
Au(111) support, performed with scanning tunneling microscopy,
X-ray photoelectron spectroscopy, and low-energy-electron
and X-ray-diffraction techniques. Depending on the
deposition temperature, the O2 partial pressure, and the availability
of water during oxide formation, two growth regimes can
be distinguished. At high oxygen pressure, the MgO mainly
adopts a square-lattice configuration and exposes the nonpolar
(001) surface, whereas at low O2 pressure a hexagonal lattice
develops that resembles the (111) surface of rocksalt MgO. For
films beyond the monolayer limit, the emerging electrostatic dipole along theMgO(111) direction becomes important for the
film morphology. Depending on the preparation conditions, the system takes either structural or adsorption-mediated routes
to remove the polarity. Whereas surface roughening is identified as main polarity-compensation mechanism at perfect vacuum
conditions, hydroxylation becomes important if water is present during oxide growth. (literal)
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