Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects (Articolo in rivista)

Type
Label
  • Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects (Articolo in rivista) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1088/0957-4484/23/47/475301 (literal)
Alternative label
  • Simone Napolitano, Mario D'Acunto, Paolo Baschieri, Enrico Gnecco, Pasqualantonio Pingue (2012)
    Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects
    in Nanotechnology (Bristol, Online); IOP Publishing Ltd., Bristol BS1 6BE (Regno Unito)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Simone Napolitano, Mario D'Acunto, Paolo Baschieri, Enrico Gnecco, Pasqualantonio Pingue (literal)
Pagina inizio
  • 475301 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 23 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 47 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Laboratory of Polymer and Soft Matter Dynamics, Faculté des Sciences, Université Libre de Bruxelles, Boulevard du Triomphe, Brussels, 1050, Belgium Istituto di Struttura della Materia del CNR, ISM-CNR, Via Fosso del Cavaliere 100, I-00133, Rome, Italy Istituto Nazionale di Ottica del CNR, via Moruzzi 1, I-56100 Pisa, Italy Instituto Madrileño de Estudios Avanzados en Nanociencia (IMDEA Nanociencia), Campus Universitario de Cantoblanco, Calle Faraday 9, 28049 Madrid, Spain NEST, Istituto Nanoscienze--CNR and Scuola Normale Superiore, Piazza San Silvestro 12, I-56127 Pisa, Italy (literal)
Titolo
  • Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects (literal)
Abstract
  • We demonstrate how AFM nanolithography, with a proper choice of scan pattern, can induce an exceptionally ordered alignment of ripples on the surface of polymer films on the first scan. By analogy with the manipulation of nanoparticles, the orientation of the ripples is determined by the material flow, which is ultimately fixed by the direction of motion of the probing tip. This makes a raster scan pattern the best choice for orienting the ripples, as opposed to the zigzag scan pattern commonly adopted by most AFM setups. Our hypothesis is substantiated by a series of measurements on a solvent-enriched ultrathin film of PET, which allowed ripple formation on the first scan. We also show how the ripple orientation is significantly modified by the boundary conditions appearing when nanolithography is performed on circular, triangular and L-shaped areas on the polymer surface. (literal)
Editore
Prodotto di
Autore CNR

Incoming links:


Prodotto
Autore CNR di
Editore di
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
data.CNR.it