http://www.cnr.it/ontology/cnr/individuo/prodotto/ID189664
Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects (Articolo in rivista)
- Type
- Label
- Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects (Articolo in rivista) (literal)
- Anno
- 2012-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1088/0957-4484/23/47/475301 (literal)
- Alternative label
Simone Napolitano, Mario D'Acunto, Paolo Baschieri, Enrico Gnecco, Pasqualantonio Pingue (2012)
Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects
in Nanotechnology (Bristol, Online); IOP Publishing Ltd., Bristol BS1 6BE (Regno Unito)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Simone Napolitano, Mario D'Acunto, Paolo Baschieri, Enrico Gnecco, Pasqualantonio Pingue (literal)
- Pagina inizio
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Laboratory of Polymer and Soft Matter Dynamics, Faculté des Sciences, Université Libre de Bruxelles, Boulevard du Triomphe, Brussels, 1050, Belgium
Istituto di Struttura della Materia del CNR, ISM-CNR, Via Fosso del Cavaliere 100, I-00133, Rome, Italy
Istituto Nazionale di Ottica del CNR, via Moruzzi 1, I-56100 Pisa, Italy
Instituto Madrileño de Estudios Avanzados en Nanociencia (IMDEA Nanociencia), Campus Universitario de Cantoblanco, Calle Faraday 9, 28049 Madrid, Spain
NEST, Istituto Nanoscienze--CNR and Scuola Normale Superiore, Piazza San Silvestro 12, I-56127 Pisa, Italy (literal)
- Titolo
- Ordered rippling of polymer surfaces by nanolithography: influence of scan pattern and boundary effects (literal)
- Abstract
- We demonstrate how AFM nanolithography, with a proper choice of scan pattern, can induce
an exceptionally ordered alignment of ripples on the surface of polymer films on the first scan.
By analogy with the manipulation of nanoparticles, the orientation of the ripples is determined
by the material flow, which is ultimately fixed by the direction of motion of the probing tip.
This makes a raster scan pattern the best choice for orienting the ripples, as opposed to the
zigzag scan pattern commonly adopted by most AFM setups. Our hypothesis is substantiated
by a series of measurements on a solvent-enriched ultrathin film of PET, which allowed ripple
formation on the first scan. We also show how the ripple orientation is significantly modified
by the boundary conditions appearing when nanolithography is performed on circular,
triangular and L-shaped areas on the polymer surface. (literal)
- Editore
- Prodotto di
- Autore CNR
Incoming links:
- Prodotto
- Autore CNR di
- Editore di
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi