http://www.cnr.it/ontology/cnr/individuo/prodotto/ID187454
Micromachined silicon suspended wires with submicrometric dimensions (Articolo in rivista)
- Type
- Label
- Micromachined silicon suspended wires with submicrometric dimensions (Articolo in rivista) (literal)
- Anno
- 2001-01-01T00:00:00+01:00 (literal)
- Alternative label
Bruschi, P; Diligenti, A ; Piotto, M (2001)
Micromachined silicon suspended wires with submicrometric dimensions
in Microelectronic engineering; North Holland Pub. Co., Amsterdam (Paesi Bassi)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Bruschi, P; Diligenti, A ; Piotto, M (literal)
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- Rivista
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- ISI Web of Science (WOS) (literal)
- Scopu (literal)
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- Dipartimento di Ingegneria dell' Informazione: Elettronica, Informatica, Telecomunicazioni,
Universita` degli Studi di Pisa, via Diotisalvi, 2, I-56126 Pisa, Italy (literal)
- Titolo
- Micromachined silicon suspended wires with submicrometric dimensions (literal)
- Abstract
- Silicon suspended wires with a cross section of about 0.25 mum(2) have been fabricated by means of a simple process, starting from a SOI n-type wafer. Standard lithography, isotropic and anisotropic etchings were used. The process requires only two masks with a minimum dimension of 4 mum. After the definition of the suspended structures a further oxidation step was performed in order to reduce the silicon core dimensions. Particular care was devoted to the rinsing step to avoid any sticking problem to the substrate. (literal)
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