http://www.cnr.it/ontology/cnr/individuo/prodotto/ID187353
Formation and stability of a two-dimensional nickel silicide on Ni(111): An Auger, LEED, STM, and high-resolution photoemission study (Articolo in rivista)
- Type
- Label
- Formation and stability of a two-dimensional nickel silicide on Ni(111): An Auger, LEED, STM, and high-resolution photoemission study (Articolo in rivista) (literal)
- Anno
- 2012-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1103/PhysRevB.85.245306 (literal)
- Alternative label
Lalmi B.; Girardeaux C.; Portavoce A.; Ottaviani C.; Aufray B.; Bernardini J. (2012)
Formation and stability of a two-dimensional nickel silicide on Ni(111): An Auger, LEED, STM, and high-resolution photoemission study
in Physical review. B, Condensed matter and materials physics
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Lalmi B.; Girardeaux C.; Portavoce A.; Ottaviani C.; Aufray B.; Bernardini J. (literal)
- Pagina inizio
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- http://link.aps.org/doi/10.1103/PhysRevB.85.245306 (literal)
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- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
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- ISI Web of Science (WOS) (literal)
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- Synchrotron SOLEIL, L'Orme des Merisiers, Boite Postale 48, 91192 Saint-Aubin, France
IM2NP (UMR 6242), CNRS, Aix-Marseille Université, Faculté des Sciences et Techniques, Campus de Saint-Jérôme, F-13397 Marseille cedex 20, France
CNR-ISM, via Fosso del Cavaliere, 00133 Roma, Italy
CINaM-CNRS, Campus de Luminy Case 913; 13288 Marseille cedex 09, France (literal)
- Titolo
- Formation and stability of a two-dimensional nickel silicide on Ni(111): An Auger, LEED, STM, and high-resolution photoemission study (literal)
- Abstract
- Using low-energy electron diffraction (LEED), Auger electron spectroscopy (AES), scanning tunneling microscopy (STM), and high-resolution photoelectron spectroscopy (HR-PES) techniques we have studied the annealing effect of one silicon monolayer deposited at room temperature onto a Ni (111) substrate. The variations of the Si surface concentration, recorded by AES at 300 °C and 400 °C, show at the beginning a rapid Si decrease followed by a slowing down up to a plateau equivalent to about one third of a silicon monolayer. STM images and LEED patterns, both recorded at room temperature just after annealing, reveal the formation of an ordered hexagonal superstructure of (?3×?3)R30? type. From these observations and from a quantitative analysis of HR-PES data, recorded before and after annealing, we propose that the (?3×?3)R30? superstructure corresponds to a two-dimensional Ni2Si surface silicide. (literal)
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