Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products (Articolo in rivista) (literal)

Anno

• 2010-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1002/ppap.200900159 (literal)

Alternative label

• Fiorenza Fanelli, Sara Lovascio, Riccardo d'Agostino, Farzaneh Arefi-Khonsari, Francesco Fracassi (2010)
  Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products
  in Plasma processes and polymers (Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Fiorenza Fanelli, Sara Lovascio, Riccardo d'Agostino, Farzaneh Arefi-Khonsari, Francesco Fracassi (literal)

Pagina inizio

• 535 (literal)

Pagina fine

• 543 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 7 (literal)

Rivista

• Plasma processes and polymers (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 9 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 7 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Dipartimento di Chimica, Università degli Studi di Bari Aldo Moro-IMIP CNR, via Orabona 4, 70126 Bari, Italy Laboratoire de Génie des Procedés Plasmas et Traitements de Surfaces, EA3492, Université Pierre et Marie Curie ENSCP, 11 rue Pierre et Marie Curie, Paris 75005, France (literal)

Titolo

• Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products (literal)

Abstract

• The thin film deposition in DBDs fed with Ar/HMDSO/O2 mixtures was studied by comparing the FT-IR spectra of the deposits with the GC-MS analyses of the exhaust gas. Under the experimental conditions investigated, oxygen addition does not enhance the activation of the monomer while it highly influences the chemical composition and structure of the deposited coating as well as the quali-quantitative distribution of by-products in the exhaust. Without oxygen addition a coating with high monomer structure retention is obtained and the exhaust contains several by-products such as silanes, silanols, and linear and cyclic siloxanes. The dimethylsiloxane unit seems to be the most important building block of oligomers. Oxygen addition to the feed is responsible for an intense reduction of the organic character of the coating as well as for a steep decrease, below the quantification limit, of the concentration of all by-products except silanols. Some evidences induce to claim that the silanol groups contained in the deposits are formed through heterogeneous (plasma-surface) reactions. (literal)

Prodotto di

• Istituto di Nanotecnologia (NANOTEC) (Istituto)

Autore CNR

• FIORENZA FANELLI (Unità di personale interno)
• RICCARDO D'AGOSTINO (Persona)
• FRANCESCO FRACASSI (Persona)

Insieme di parole chiave

• Keywords of "Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)

Autore CNR di

• RICCARDO D'AGOSTINO (Persona)
• FRANCESCO FRACASSI (Persona)
• FIORENZA FANELLI (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Plasma processes and polymers (Rivista)

Insieme di parole chiave di

• Keywords of "Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products" (Insieme di parole chiave)