Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template (Articolo in rivista) (literal)

Anno

• 2011-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.mee.2011.02.007 (literal)

Alternative label

• Grenci, G; Pozzato, A; Carpentiero, A ; Sovernigo, E; Tormen, M (2011)
  Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template
  in Microelectronic engineering; ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS, AMSTERDAM (Paesi Bassi)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Grenci, G; Pozzato, A; Carpentiero, A ; Sovernigo, E; Tormen, M (literal)

Pagina inizio

• 2552 (literal)

Pagina fine

• 2555 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 88 (literal)

Rivista

• Microelectronic engineering (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 4 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 8 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• IOM CNR, Lab TASC, I-34149 Trieste, Italy; ThunderNIL Srl, I-35131 Padua, Italy; Univ Trieste, Grad Sch Nanotechnol, I-34127 Trieste, Italy (literal)

Titolo

• Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template (literal)

Abstract

• A nanofabrication process for high resolution X-ray optics and X-ray lithography masks was developed. The process is based on the plasma etching of a sacrificial hard inorganic interlayer (Si, Si(3)N(4), SiO(x) or HSQ) used for pattern transfer and aspect ratio amplification. The structures are first defined on a top thin metal film by electron beam lithography and lift-off; a thin nickel layer at the bottom of the hard interlayer is used as etch stop. A base plating (Cr/Au) under the nickel serves as seed layer for the electroplating of an X-ray absorber or phase shifting material. The fabrication is completed by the stripping of the hard template by wet or dry etching. Compared to methods based on analogous process schemes, in which the aspect ratio of nanostructures is instead amplified by pattern transfer into a sacrificial polymer interlayer by oxygen plasma, the investigated method is advantageous for the higher mechanical stability of the nanostructured hard templates with respect to the polymer ones, thus enabling the realization of higher aspect ratio features. (C) 2011 Elsevier B.V. All rights reserved. (literal)

Editore

• ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS (Editore)

Autore CNR

• ALESSANDRO POZZATO (Persona)
• GIANLUCA GRENCI (Unità di personale interno)
• MASSIMO TORMEN (Unità di personale interno)

Insieme di parole chiave

• Keywords of "Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• MASSIMO TORMEN (Unità di personale interno)
• GIANLUCA GRENCI (Unità di personale interno)
• ALESSANDRO POZZATO (Persona)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Microelectronic engineering (Rivista)

Editore di

• ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS (Editore)

Insieme di parole chiave di

• Keywords of "Nanofabrication of hard X-ray optics by metal electroplating in a dry etched mechanically stable inorganic template" (Insieme di parole chiave)