http://www.cnr.it/ontology/cnr/individuo/prodotto/ID182236
Analysis of Self-Heating-Related Instability in Self-Aligned p-Channel Polycrystalline-Silicon Thin-Film Transistors (Articolo in rivista)
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- Analysis of Self-Heating-Related Instability in Self-Aligned p-Channel Polycrystalline-Silicon Thin-Film Transistors (Articolo in rivista) (literal)
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- 2010-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1109/LED.2010.2051137 (literal)
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Gaucci P.; Valletta A.; Mariucci L.; Pecora A.; Maiolo L.; Fortunato G. (2010)
Analysis of Self-Heating-Related Instability in Self-Aligned p-Channel Polycrystalline-Silicon Thin-Film Transistors
in IEEE electron device letters (Print); IEEE-Institute Of Electrical And Electronics Engineers Inc., Piscataway (Stati Uniti d'America)
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- Gaucci P.; Valletta A.; Mariucci L.; Pecora A.; Maiolo L.; Fortunato G. (literal)
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- http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=5498870 (literal)
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- Titolo
- Analysis of Self-Heating-Related Instability in Self-Aligned p-Channel Polycrystalline-Silicon Thin-Film Transistors (literal)
- Abstract
- Self-heating-related instabilities have been studied in p-channel polycrystalline-silicon thin-film transistors. The spatial distribution of the interface-state and fixed-oxide-charge densities generated during self-heating experiments has been analyzed and quantitatively determined by using negative-bias temperature stress experiments and 2-D numerical simulations. In addition, the observed asymmetry in the output characteristics with respect to source/drain contact reversal is also perfectly reproduced, confirming the validity of the proposed model. (literal)
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