http://www.cnr.it/ontology/cnr/individuo/prodotto/ID180819
Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with fs-laser irradiation (Articolo in rivista)
- Type
- Label
- Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with fs-laser irradiation (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1088/0957-4484/17/13/026 (literal)
- Alternative label
V. Zorba; L. Persano; D. Pisignano; A. Athanassiou; E. Stratakis; R. Cingolani; P. Tzanetakis; C. Fotakis (2006)
Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with fs-laser irradiation
in Nanotechnology (Bristol. Print); IOP Publishing Ltd. (Institute of Physics Publishing Ltd), "Bristol ; London" (Regno Unito)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- V. Zorba; L. Persano; D. Pisignano; A. Athanassiou; E. Stratakis; R. Cingolani; P. Tzanetakis; C. Fotakis (literal)
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- ISI Web of Science (WOS) (literal)
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- 1 Institute of Electronic Structure and Laser (IESL), Foundation for Research and
Technology-Hellas (FORTH), 711 10, Heraklion, Crete, Greece
2 Physics Department, University of Crete, Heraklion 710 03, Greece
3 National Nanotechnology Laboratory (NNL) of National Research Council (CNR),
Via Arnesano, 73100, Lecce, Italy
4 Materials Science and Technology Department, University of Crete, Heraklion 710 03,
Greece (literal)
- Titolo
- Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with fs-laser irradiation (literal)
- Abstract
- We report on the wettability properties of silicon surfaces, simultaneously structured on the micrometre-scale and the nanometre-scale by femtosecond (fs) laser irradiation to render silicon hydrophobic. By varying the laser
fluence, it was possible to control the wetting properties of a silicon surface through a systematic and reproducible variation of the surface roughness. In particular, the silicon-water contact angle could be increased from 66° to
more than 130°. Such behaviour is described by incomplete liquid penetration within the silicon features, still leaving partially trapped air inside. We also show how controllable design and tailoring of the surface microstructures by wettability gradients can drive the motion of the drop's centre of mass towards a desired direction (even upwards). (literal)
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