(Fe,Mn)3O4 Nanochannels Fabricated by AFM Local-Oxidation Nanolithography using Mo/Poly(methyl methacrylate) Nanomasks (Articolo in rivista)

Type
Label
  • (Fe,Mn)3O4 Nanochannels Fabricated by AFM Local-Oxidation Nanolithography using Mo/Poly(methyl methacrylate) Nanomasks (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1002/adma.200600997 (literal)
Alternative label
  • Luca Pellegrino; Yoshihiko Yanagisawa; Mizue Ishikawa; Takuya Matsumoto; Hidekazu Tanaka; Tomoji Kawai (2006)
    (Fe,Mn)3O4 Nanochannels Fabricated by AFM Local-Oxidation Nanolithography using Mo/Poly(methyl methacrylate) Nanomasks
    in Advanced materials (Weinh., Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Luca Pellegrino; Yoshihiko Yanagisawa; Mizue Ishikawa; Takuya Matsumoto; Hidekazu Tanaka; Tomoji Kawai (literal)
Pagina inizio
  • 3099 (literal)
Pagina fine
  • 3104 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://onlinelibrary.wiley.com/doi/10.1002/adma.200600997/abstract (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 18 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 23 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR-INFM-LAMIA, Genova (Italy); Dipartimento di Fisica Universit√† di Genova, via Dodecaneso 33, Genova, 16146 (Italy); Institute of Scientific and Industrial Research, Osaka University 567-0047 (Japan) (literal)
Titolo
  • (Fe,Mn)3O4 Nanochannels Fabricated by AFM Local-Oxidation Nanolithography using Mo/Poly(methyl methacrylate) Nanomasks (literal)
Abstract
  • Epitaxial (Fe,Mn)(3)O-4 thin films are patterned into nanochannels using molybdenum/poly(methyl methacrylate) (PMMA) nanomasks realized by combining local anodic oxidation of Mo and dry etching of PMMA. Nanostructures on the 100 nm scale can be easily fabricated by subsequent wet chemical etching with H3PO4 (see figure). (Fe,Mn)304 nanochannels open the possibility of fabricating spin-polarized nanocircuits for room-temperature spintronics. (literal)
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