Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds (Articolo in rivista)

Type
Label
  • Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds (Articolo in rivista) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.tsf.2008.02.017 (literal)
Alternative label
  • Carta G.; El Habra N. ; Rossetto G.; Crociani L.; Torzo G. ; Zanella P. ; Casarin M. ; Cavinato G. ; Pace G. ; Kaciulis S. ; Mezzi A. (2008)
    Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds
    in Thin solid films (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Carta G.; El Habra N. ; Rossetto G.; Crociani L.; Torzo G. ; Zanella P. ; Casarin M. ; Cavinato G. ; Pace G. ; Kaciulis S. ; Mezzi A. (literal)
Pagina inizio
  • 7354 (literal)
Pagina fine
  • 7360 (literal)
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  • http://www.sciencedirect.com/science/article/pii/S0040609008001788 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 516 (literal)
Rivista
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  • 7 (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1-6 CNR-ICIS, C.so Stati Uniti, 4 35127 Padova, Italy 2,7,8 Dipartimento di Scienze Chimiche, Università di Padova, Via Marzolo,1, 35131 Padova, Italy 9 CNR-ISTM, Dipartimento di Processi Chimici dell'Ingegneria, Via Marzolo, 9, 35131 Padova, Italy 10,11 CNR-ISMN, P.O. Box 10, 00016 Monterotondo Stazione (RM), Italy (literal)
Titolo
  • Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds (literal)
Abstract
  • Thin films of HfO2 were grown by metal-organic chemical vapour deposition on fused quartz substrates in the temperature range of 400-500 °C using some bis(cyclopentadienyl)bis(alkoxide)hafnium (IV) precursors, namely Cp2Hf(OiPr)2, [Cp2Hf{OCH(CH3)CH2OCH3}2], [Cp2Hf{OC (CH3)2CH2OCH3}2] and [Cp2Hf{OC(CH2CH3)2CH2OCH3}2]. These complexes, analyzed by nuclear magnetic resonance and thermogravimetric measurements, resulted pure and very stable towards air and moisture. The obtained films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy and atomic force microscopy. The deposits contained hafnium and oxygen in the right stoichiometric ratio with a low carbon contamination and they consisted of monoclinic HfO2 phase (baddeleyite) with a granular surface morphology. (literal)
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