Current-controlled lithography on conducting SrTiO 3-d thin films by atomic force microscopy (Articolo in rivista)

Type
Label
  • Current-controlled lithography on conducting SrTiO 3-d thin films by atomic force microscopy (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2009054 (literal)
Alternative label
  • L. Pellegrino; E. Bellingeri; A. S. Siri; D. Marré (2005)
    Current-controlled lithography on conducting SrTiO 3-d thin films by atomic force microscopy
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • L. Pellegrino; E. Bellingeri; A. S. Siri; D. Marré (literal)
Pagina inizio
  • 064102-1 (literal)
Pagina fine
  • 064102-3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 87 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 6 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR-INFM-LAMIA, Corso Perrone 24, 16152 Genova, Italy Also at: Università di Genova, Dipartimento di Fisica, Via Dodecaneso 33, 16146 Genova, Italy (literal)
Titolo
  • Current-controlled lithography on conducting SrTiO 3-d thin films by atomic force microscopy (literal)
Abstract
  • The application of local anodic oxidation to conducting perovskite oxides such as SrTiO 3-d thin films causes a local decomposition of the films shown by the formation of mounds at the surface. The size of the patterns is limited by the dimension of the water meniscus which forms under the biased tip of the atomic force microscope (AFM). Due to the instabilities of the water meniscus, biasing with a constant voltage in contact mode does not guarantee a good uniformity of the patterns. In this work, we show and discuss how, by controlling the electrical current through the AFM tip, it is possible to realize lines with uniform widths down to 150 nm over a total length of hundreds of micrometers. (literal)
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