Double pulse ultrafast laser ablation of nickel in vacuum (Articolo in rivista)

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Label
  • Double pulse ultrafast laser ablation of nickel in vacuum (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.3159010 (literal)
Alternative label
  • T. Donnelly; J. G. Lunney; S. Amoruso; R. Bruzzese; X. Wang; X. Ni (2009)
    Double pulse ultrafast laser ablation of nickel in vacuum
    in Journal of applied physics; American Institute Of Physics (AIP), Melville (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • T. Donnelly; J. G. Lunney; S. Amoruso; R. Bruzzese; X. Wang; X. Ni (literal)
Pagina inizio
  • 013304-1 (literal)
Pagina fine
  • 013304-5 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • Selezionato da Virtual Journal of Ultrafast Science nel numero di Agosto 2009 (http://vjultrafast.aip.org/dbt/dbt.jsp?KEY=VIRT05&Volume=8&Issue=8) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://jap.aip.org/resource/1/japiau/v106/i1/p013304_s1 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 106 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 5 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 013304 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1School of Physics, Trinity College Dublin, Dublin 2, Ireland 2Dipartimento di Scienze Fisiche and Coherentia CNR-INFM, Università degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli, Italy 3Department of Electronic Engineering, Tianjin University of Technology and Education, Tianjin 300222, People's Republic of China (literal)
Titolo
  • Double pulse ultrafast laser ablation of nickel in vacuum (literal)
Abstract
  • We have studied ultrafast laser ablation of nickel using a pair of identical ~250 fs 527 nm laser pulses separated by ~1 to ~1000 ps. Scanning white light interferometry was used to measure the ablated volume, and an ion probe was used to measure the angular distribution of the ablation plasma plume and the total ion emission. As the delay of the second pulse increased from ?10 to 100 ps the ablated volume decreased by more than a factor of 2; indeed it falls to a value below the single pulse case. Conversely, it is found that the ion yield is sharply increased in this delay regime. It seems that both these features can be explained by the interaction of the second laser pulse with the ablated material produced by the first pulse. (literal)
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