http://www.cnr.it/ontology/cnr/individuo/prodotto/ID178870
Understanding the role of tunneling barriers in organic spin valves by hard x-ray photoelectron spectroscopy (Articolo in rivista)
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- Understanding the role of tunneling barriers in organic spin valves by hard x-ray photoelectron spectroscopy (Articolo in rivista) (literal)
- Anno
- 2010-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.3285179 (literal)
- Alternative label
Francesco Borgatti; Ilaria Bergenti; Federico Bona; Valentin Dediu; Andrea Fondacaro; Simo Huotari; Giulio Monaco; Donald A. MacLaren; John N. Chapman; Giancarlo Panaccione (2010)
Understanding the role of tunneling barriers in organic spin valves by hard x-ray photoelectron spectroscopy
in Applied physics letters; American Institute Of Physics (AIP), Melville (Stati Uniti d'America)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Francesco Borgatti; Ilaria Bergenti; Federico Bona; Valentin Dediu; Andrea Fondacaro; Simo Huotari; Giulio Monaco; Donald A. MacLaren; John N. Chapman; Giancarlo Panaccione (literal)
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- http://apl.aip.org/resource/1/applab/v96/i4/p043306_s1 (literal)
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- ISI Web of Science (WOS) (literal)
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- ISMN-CNR, via Gobetti 101, Bologna, Italy; ISMN-CNR, via Gobetti 101, Bologna, Italy; ISMN-CNR, via Gobetti 101, Bologna, Italy; ISMN-CNR, via Gobetti 101, Bologna, Italy; European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France; European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France; European Synchrotron Radiation Facility, BP 220, 38043 Grenoble, France; Department of Physics and Astronomy, The University of Glasgow, Glasgow G12 8QQ, United Kingdom; Department of Physics and Astronomy, The University of Glasgow, Glasgow G12 8QQ, United Kingdom; Laboratorio TASC, INFM-CNR, Area Science Park, S.S. 14, Km 163.5, 34012 Trieste, Italy (literal)
- Titolo
- Understanding the role of tunneling barriers in organic spin valves by hard x-ray photoelectron spectroscopy (literal)
- Abstract
- We present an ex situ, nondestructive chemical characterization of deeply buried organic-inorganic interfaces using hard x-ray photoelectron spectroscopy. Co/Alq3 and Co/AlOx/Alq3 interfaces were studied in order to determine the role of a thin (1-2 nm) AlOx interdiffusion barrier in organic spin valves. Interfacial Alq3, 15 nm below the surface, exhibits strong sensitivity to the electronic structure of the interfacial region and to the presence of the AlOx. In addition to reducing Co-Alq3 interdiffusion, we find that the barrier prevents charge donation from the Co to the interfacial Alq3, thus preventing the formation of Alq3 anions within the interface region. (literal)
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