Nano-graphene structures deposited by N-IR pulsed laser ablation of graphite on Si (Articolo in rivista)

Type
Label
  • Nano-graphene structures deposited by N-IR pulsed laser ablation of graphite on Si (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.apsusc.2007.09.098 (literal)
Alternative label
  • Cappelli E.1; Orlando S.2; Servidori M.3; Scilletta C.1 (2007)
    Nano-graphene structures deposited by N-IR pulsed laser ablation of graphite on Si
    in Applied surface science
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Cappelli E.1; Orlando S.2; Servidori M.3; Scilletta C.1 (literal)
Pagina inizio
  • 1273 (literal)
Pagina fine
  • 1278 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • Conference: Symposium on Laser Synthesis and Processing of Advanced Materials held at the E-MRS 2007 Spring Meeting Location: Strasbourg, FRANCE Date: 2007 Sponsor(s): European Mat Res Soc (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 254 (literal)
Rivista
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  • 6 (literal)
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  • 4 (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 CNR-ISC, Montelibretti, Via Salaria Km 29.3, P.O.B. 10, 00016 Monterotondo, Rome, Italy 2 CNR-IMIP, Potenza, Zona Industriale, 85050 Tito Scalo, Potenza, Italy 3 CNR-IMM, Bologna, Via P. Gobetti 101, 40129 Bologna, Italy (literal)
Titolo
  • Nano-graphene structures deposited by N-IR pulsed laser ablation of graphite on Si (literal)
Abstract
  • Thin nano-structured carbon films have been deposited in vacuum by pulsed laser ablation, from a rotating polycrystalline graphite target, on Si (1 0 0) substrates, kept at temperatures ranging from RT to 800 degrees C. The laser ablation was performed by a Nd:YAG laser, operating in the near IR (lambda = 1064 nm). X-ray diffraction analysis, performed at grazing incidence angle, both in-plane (ip-gid) and out-of-plane (op-gid), has shown the growth of oriented nano-sized graphene particles, characterised by high inter-planar stacking distance (d(c) similar to 0.39 nm), compared to graphite. The film structure and texturing are strongly related both to laser wavelength and substrate temperature: the low energy associated to the IR laser radiation (1.17 eV) generates activated carbon species of large dimensions that, also at low T (similar to 400 degrees C), easy evolve toward more stable sp(2) aromatic bonds, in the plume direction. Increasing temperature the nano-structure formation increases, causing a further aggregation of aromatic planes, voids formation, and a related density (by X-ray reflectivity) drop to very low values. SEM and STM show for these samples a strongly increased macroscopic roughness. The whole process, mainly at higher temperatures, is characterised by a fast kinetic mode, far from equilibrium and without any structural or spatial rearrangement. (literal)
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