Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling (Articolo in rivista) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/S0167-9317(03)00372-1 (literal)

Alternative label

• De Wolf I.; Senez V.; Balboni R.; Armigliato A.; Frabboni S.; Cedola A.; Lagomarsino S. (2003)
  Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling
  in Microelectronic engineering; ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS, AMSTERDAM (Paesi Bassi)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• De Wolf I.; Senez V.; Balboni R.; Armigliato A.; Frabboni S.; Cedola A.; Lagomarsino S. (literal)

Pagina inizio

• 425 (literal)

Pagina fine

• 435 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 70 (literal)

Rivista

• Microelectronic engineering (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 11 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 2-4 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• IMEC VZW, B-3001 Louvain, Belgium IEMN, ISEN, CNRS, UMR 8520, F-59652 Villeneuve Dascq, France CNR, IMM, Sez Bologna, I-40129 Bologna, Italy Univ Modena & Reggio Emilia, Dipartimento Fis, I-41100 Modena, Italy CNR, IFN, I-00156 Rome, Italy (literal)

Titolo

• Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling (literal)

Abstract

• In this paper, three techniques are discussed that provide information on process-induced local mechanical stress in silicon: the convergent beam electron diffraction technique of transmission electron microscopy, X-ray micro-diffraction and micro-Raman spectroscopy. We discuss the principles of these techniques, their spatial resolution, the ease-of-use, the information that can be obtained, the required sample preparation, the measurement time, and the complementarities of these techniques. We demonstrate this for stress induced by shallow trench isolation and correlate the results to finite element analysis results. (literal)

Editore

• ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS (Editore)

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Autore CNR

• ALDO ARMIGLIATO (Persona)
• STEFANO LAGOMARSINO (Persona)
• ALESSIA CEDOLA (Persona)
• ROBERTO BALBONI (Unità di personale interno)

Insieme di parole chiave

• Keywords of "Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• ALESSIA CEDOLA (Persona)
• ROBERTO BALBONI (Unità di personale interno)
• ALDO ARMIGLIATO (Persona)
• STEFANO LAGOMARSINO (Persona)

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)
• Istituto di fotonica e nanotecnologie (IFN) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Microelectronic engineering (Rivista)

Editore di

• ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS (Editore)

Insieme di parole chiave di

• Keywords of "Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling" (Insieme di parole chiave)