http://www.cnr.it/ontology/cnr/individuo/prodotto/ID171151
Characterization of gaseous phase and nanoparticles produced in ultra-short pulsed laser ablation of transition metal borides (Articolo in rivista)
- Type
- Label
- Characterization of gaseous phase and nanoparticles produced in ultra-short pulsed laser ablation of transition metal borides (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.apsusc.2010.11.183 (literal)
- Alternative label
De Bonis A. ; Teghil R. ; Rau J.V. ; Galasso A. ; Orlando S. ; Santagata A. (2011)
Characterization of gaseous phase and nanoparticles produced in ultra-short pulsed laser ablation of transition metal borides
in Applied surface science; ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS, AMSTERDAM (Paesi Bassi)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- De Bonis A. ; Teghil R. ; Rau J.V. ; Galasso A. ; Orlando S. ; Santagata A. (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
- http://dx.doi.org/10.1016/j.apsusc.2010.11.183 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Dipartimento di Chimica A.M. Tamburro, Università degli Studi della Basilicata, Via dellAteneo Lucano 10, 85100 Potenza, Italy
CNR-IMIP, U.O.S. di Potenza, Zona Industriale di Tito Scalo, 85050 Tito Scalo (PZ), Italy
CNR-ISM, Via Fosso del Cavaliere 100, 00133 Rome, Italy (literal)
- Titolo
- Characterization of gaseous phase and nanoparticles produced in ultra-short pulsed laser ablation of transition metal borides (literal)
- Abstract
- The plasma produced by ultra-short laser ablation of ZrB2 and ReB2 has been studied by ICCD imaging and time and space resolved optical emission spectroscopy. The aim was to clarify the mechanism of deposition leading to the morphology and composition found in the deposited films. The results indicate that for all systems the film characteristics are compatible with a deposition mechanism involving a growth from nanoparticles, ejected directly from the target, whose composition can be interpreted in terms of equilibrium vaporization during the flight from the target to the substrate. (literal)
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