Highly photorefractive Eu3+ activated sol-gel SiO2-SnO2 thin film waveguides (Contributo in atti di convegno)

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  • Highly photorefractive Eu3+ activated sol-gel SiO2-SnO2 thin film waveguides (Contributo in atti di convegno) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1117/12.843210 (literal)
Alternative label
  • S.Berneschi, S.N.B. Bhaktha, A. Chiappini, A. Chiasera, M. Ferrari, C. Kinowski, S. Turrell, C. Trono, M. Brenci, I. Cacciari, G. Nunzi Conti, S. Pelli, G. C. Righini (2010)
    Highly photorefractive Eu3+ activated sol-gel SiO2-SnO2 thin film waveguides
    in SPIE Photonic West Conference 7604 Integrated Optics: Devices, Materials, and Technologies XIV,, San Francisco, California, USA, 23 - 28 January 2010
    (literal)
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  • S.Berneschi, S.N.B. Bhaktha, A. Chiappini, A. Chiasera, M. Ferrari, C. Kinowski, S. Turrell, C. Trono, M. Brenci, I. Cacciari, G. Nunzi Conti, S. Pelli, G. C. Righini (literal)
Pagina inizio
  • 76040Z-1 (literal)
Pagina fine
  • 76040Z-6 (literal)
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  • 7604 (literal)
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  • Proceedings of SPIE Vol. 7604 (2010) pp. 76040Z-1/6 doi: 10.1117/12.843210 Oral communication at SPIE Photonic West Conference 7604 Integrated Optics: Devices, Materials, and Technologies XiV, 23 - 28 January 2010, The Moscone Center, San Francisco, California, United States. We report on the photorefractive properties of tin-silica slab waveguides, deposited on vitreous-SiO2 by means of sol-gel dip-coating technique. The basic composition of these amorphous binary systems is 75 SiO2 - 25 SnO2 mol% with 1mol% of Eu3+ ions. Europium was chosen as an optical probe of the glass structure. These guiding structures exhibit low propagation losses (around 0.5 dB/cm at 633 nm) and a high refractive index modulation, as large as – 1.5 × 10^-3 under the UV irradiation of a KrF excimer laser source at » = 248 nm, suitable for writing waveguide gratings. (literal)
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  • Rare-earth activated optical waveguides today represent a key structure in many commercial devices for communications and sensing. Among all the fabrication processes used in technology, UV laser writing in photorefractive materials gained an ever-growing interest due to its simplicity and relatively low cost. Even if germanium ions are the most used elements as photosensitive dopants in silica materials, tin ions represent a promising alternative because many devices, such as Bragg gratings, present a higher thermal stability in this matrix rather than in germanium-silica network. Bulk glass materials doped with SnO2 have been prepared by different fabrication methods, such as melting and/or sol-gel processes, and their photosensitivity response under the UV laser irradiation was well demonstrated together with the possibility to obtain optical devices. Another promising route to fabricate photorefractive materials, principally based on SiO2-SnO2 binary system, is represented by a thin film deposition on a dielectric substrate. Different fabrication processes were adopted for this purpose such as helicon activated reactive evaporation (HARE) and modified chemical vapor deposition (MCVD). Here we report on the photorefractive properties of tin-silica thin films, deposited on vitreous-SiO2 by means of sol-gel dip-coating technique. The basic composition of these amorphous binary systems is 75SiO2-25SnO2 mol% and they are activated by 1 mol% of Eu3+ ions. Europium was chosen as an optical probe of the glass structure. These guiding structures exhibit low propagation losses (around 0.5 dB/cm at 633 nm) and a high refractive index modulation, as large as -1.5 × 10-3 under the UV irradiation of a KrF excimer laser source at 248 nm, suitable for writing waveguide gratings. (literal)
Note
  • Scopu (literal)
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  • S.Berneschi, M. Brenci, I. Cacciari, G. Nunzi Conti, S. Pelli, G. C. Righini - MDF Lab., IFAC-CNR, Via Madonna del Piano 10, 50019 Sesto Fiorentino, Florence, Italy. S.N.B. Bhaktha - LPMC, CNRS-UMR 6622, Université de Nice-Sophia Antipolis, Parc Valrose, 06108 Nice Cedex 02, France. A. Chiappini, A. Chiasera, M. Ferrari - CSMFO Lab., IFN-CNR, Via alla Cascata 56/c, 38050 Povo-Trento, Italy. C. Kinowski, S. Turrell - LASIR (CNRS, UMR 8516), Université des Sciences et Technologies de Lille, 59655 Villeneuve d’Ascq, France. C. Trono - CBS Lab, IFAC-CNR, Via Madonna del Piano 10, 50019 Sesto Fiorentino, Florence, Italy. (literal)
Titolo
  • Highly photorefractive Eu3+ activated sol-gel SiO2-SnO2 thin film waveguides (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 9780819480002 (literal)
Abstract
  • We report on the photorefractive properties of tin-silica slab waveguides, deposited on vitreous-SiO2 by means of sol-gel dip-coating technique. The basic composition of these amorphous binary systems is 75 SiO2 - 25 SnO2 mol% with 1 mol% of Eu3+ ions. Europium was chosen as an optical probe of the glass structure. These guiding structures exhibit low propagation losses (around 0.5 dB/cm at 633 nm) and a high refractive index modulation, as large as - 1.5 × 10-3 under the UV irradiation of a KrF excimer laser source at ? = 248 nm, suitable for writing waveguide gratings. © 2010 Copyright SPIE - The International Society for Optical Engineering. (literal)
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