Laser irradiation, ion implantation and e-beam writing of integrated optical structures (Contributo in atti di convegno)

Type
Label
  • Laser irradiation, ion implantation and e-beam writing of integrated optical structures (Contributo in atti di convegno) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1117/12.609231 (literal)
Alternative label
  • G.C. Righini, I. Banyasz, S. Berneschi, M. Brenci, A. Chiasera, M. Cremona, D. Ehrt, M. Ferrari, R.M. Montereali, G. Nunzi Conti, S. Pelli, S. Sebastiani, C. Tosello G.C. Righini, I.Banyasz, S.Berneschi, M.Brenci, A. Chiasera, M.Cremona, D.Ehrt, M.Ferrari, R.M. Montereali, G.Nunzi-Conti, S.Pelli, S.Sebastiani, C.Tosello (2005)
    Laser irradiation, ion implantation and e-beam writing of integrated optical structures
    in SPIE Microtechnologies for the New Millennium 2005, Sevilla (Spain), 9-11 May 2005
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • G.C. Righini, I. Banyasz, S. Berneschi, M. Brenci, A. Chiasera, M. Cremona, D. Ehrt, M. Ferrari, R.M. Montereali, G. Nunzi Conti, S. Pelli, S. Sebastiani, C. Tosello G.C. Righini, I.Banyasz, S.Berneschi, M.Brenci, A. Chiasera, M.Cremona, D.Ehrt, M.Ferrari, R.M. Montereali, G.Nunzi-Conti, S.Pelli, S.Sebastiani, C.Tosello (literal)
Pagina inizio
  • 649 (literal)
Pagina fine
  • 657 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • Proc. SPIE, vol. 5840, 649-657 (2005) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 5840 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • SPIE Proceedings, Vol. 5840, pp. 649-657 (2005). Oral Communication: Microtechnologies for the New Millennium 2005, 9-11 May 2005, Sevilla, Spain. (literal)
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • IFAC-CNR, \"N.Carrara\" Institute of Applied Physics, Firenze: Institute of Solid State Physics and Optics, Budapest; CSMFO Group, Institute of Photonic and Nanotechnologies - CNR, Povo, Trento; PUC-Rio, Physicd Dep., Rio de Janeiro, Brazil; Otto-Schott Institut, Friedrich-Schiller-Universitaet Jena, Germany; ENEA C.R., Frascati, UTS Tecnologie Fisiche Avanzate; University of Trento, Physics Dep. Trento. (literal)
Titolo
  • Laser irradiation, ion implantation and e-beam writing of integrated optical structures (literal)
Abstract
  • Much attention is currently being paid to the materials and processes that allow one to directly write or to imprint waveguiding structures and/or diffractive elements for optical integrated circuits by exposure from a source of photons, electrons or ions. Here a brief overview of the results achieved in our laboratories is presented, concerning the fabrication and characterization of optical guiding structures based on different materials and exposure techniques. These approaches include: electron and ion beam writing of waveguides in (poly)-crystalline lithium fluoride. uv-laser printing of waveguides and gratings in photorefractive glass thin films, and fs-laser writing in tellurite glasses. Properties and perspectives of these approaches are also discussed. (literal)
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