http://www.cnr.it/ontology/cnr/individuo/prodotto/ID169690
Spectral characterization of two-dimensional Thue-Morse quasicrystals realized with high resolution lithography (Articolo in rivista)
- Type
- Label
- Spectral characterization of two-dimensional Thue-Morse quasicrystals realized with high resolution lithography (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1088/2040-8978/13/1/015602 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Matarazzo V. [ 1 ] ; De Nicola S. [ 2 ] ; Zito G. [ 1 ] ; Mormile P. [ 1 ] ; Rippa M. [ 1 ] ; Abbate G. [ 3,4 ] ; Zhou J. [ 5 ] ; Petti L. [ 1 ] (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- [ 1 ] CNR, Ist Cibernet E Caianiello, I-80078 Pozzuoli, Na, Italy
[ 2 ] CNR, Ist Nazl Ott, I-80078 Pozzuoli, Na, Italy
[ 3 ] Univ Naples Federico 2, CNR SPIN, I-80126 Naples, Italy
[ 4 ] Univ Naples Federico 2, Dept Phys, I-80126 Naples, Italy
[ 5 ] Univ Ningbo City, Photon Inst, Ningbo City, Zhejiang, Peoples R China (literal)
- Titolo
- Spectral characterization of two-dimensional Thue-Morse quasicrystals realized with high resolution lithography (literal)
- Abstract
- One-dimensional Thue-Morse (ThMo) lattices are examples of self-similar structures that exhibit bandgap phenomena. ThMo multilayers may also possess fractal photonic bandgaps that give rise to large omnidirectional reflectance and light-emission enhancement effects. Two-dimensional (2D) ThMo aperiodic quasicrystals possess interesting properties for photonic applications too. Here we demonstrate the experimental fabrication of large area 2D ThMo lattices into polymeric substrates at nanometre scale by electron beam lithography (EBL). Far field diffraction patterns of the experimental ThMo structures have been measured and compared with the calculated theoretical Fourier spectra. Scanning electron microscopy and far field diffraction are used to characterize the experimental structures. (literal)
- Prodotto di
- Autore CNR
- Insieme di parole chiave
Incoming links:
- Autore CNR di
- Prodotto
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
- Insieme di parole chiave di