Nanostructured rhodium films produced by pulsed laser deposition for nuclear fusion applications (Articolo in rivista)

Type
Label
  • Nanostructured rhodium films produced by pulsed laser deposition for nuclear fusion applications (Articolo in rivista) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.jnucmat.2010.06.015 (literal)
Alternative label
  • M. Passoni a,b,*, D. Dellasega a,b, G. Grosso b, C. Conti c, M.C. Ubaldi d, C.E. Bottani a,b (2010)
    Nanostructured rhodium films produced by pulsed laser deposition for nuclear fusion applications
    in Journal of nuclear materials; Academic Press Elsevier, Amsterdam (Paesi Bassi)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M. Passoni a,b,*, D. Dellasega a,b, G. Grosso b, C. Conti c, M.C. Ubaldi d, C.E. Bottani a,b (literal)
Pagina inizio
  • 1 (literal)
Pagina fine
  • 5 (literal)
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  • http://www.elsevier.com/locate/jnucmat (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 404 (literal)
Rivista
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  • 1 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • a Dipartimento di Energia, Politecnico di Milano, Milan, Italy b Istituto di Fisica del Plasma, Consiglio Nazionale delle Ricerche, EURATOM-ENEA-CNR Association, Milan, Italy c Istituto per la Conservazione e la Valorizzazione dei Beni Culturali, Consiglio Nazionale delle Ricerche, Milan, Italy d Dipartimento di Elettronica e Informazione, Politecnico di Milano and Fondazione Politecnico di Milano, Milan, Italy (literal)
Titolo
  • Nanostructured rhodium films produced by pulsed laser deposition for nuclear fusion applications (literal)
Abstract
  • In this paper the possibilities offered by pulsed laser deposition (PLD) for the production of nanostruc- tured rhodium films with improved properties are explored. Thanks to its high reflectivity and low sput- tering yield, rhodium is one of the best candidates for the development of thin films to be used in first mirrors, which are crucial components in many diagnostic systems of thermonuclear magnetic fusion machines, like tokamaks. Due to the features of PLD, by varying the process parameters it is possible to tailor both the structure, i.e. the nanocrystalline domain size of the deposited films, down to less than 5 nm and separately control the other relevant physical properties. This leads to modifications in growth regime and annealing dynamics, in such a way that both morphology and reflectivity achieve the prop- erties demanded to use these films as mirrors for fusion applications, opening at the same time new pos- sibilities for the future improvement of thermo-mechanical and adhesion properties. (literal)
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