How far will silicon nanocrystals push the scaling limits of NVMs technologies? (Contributo in atti di convegno)

Type
Label
  • How far will silicon nanocrystals push the scaling limits of NVMs technologies? (Contributo in atti di convegno) (literal)
Anno
  • 2003-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1109/IEDM.2003.1269352 (literal)
Alternative label
  • De Salvo B, Gerardi C, Lombardo S, Baron T, Perniola L, Mariolle D, Mur P, Toffoli A, Gely M, Semeria MN, Deleonibus S, Ammendola G, Ancarani V, Melanotte M, Bez R, Baldi L, Corso D, Crupi I, Puglisi RA, Nicotra G, Rimini E, Mazen F, Ghibaudo G, Pananakak (2003)
    How far will silicon nanocrystals push the scaling limits of NVMs technologies?
    in International Electron Devices Meeting, 2003. IEDM '03, Washington DC, USA, 8-10 Dec. 2003
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • De Salvo B, Gerardi C, Lombardo S, Baron T, Perniola L, Mariolle D, Mur P, Toffoli A, Gely M, Semeria MN, Deleonibus S, Ammendola G, Ancarani V, Melanotte M, Bez R, Baldi L, Corso D, Crupi I, Puglisi RA, Nicotra G, Rimini E, Mazen F, Ghibaudo G, Pananakak (literal)
Pagina inizio
  • 26.1.1 (literal)
Pagina fine
  • 26.1.4 (literal)
Note
  • Google S (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CEA-LETI, Grenoble, France; Politecnico di Milano; IMM-CNR Catania; STMicroelectronics (literal)
Titolo
  • How far will silicon nanocrystals push the scaling limits of NVMs technologies? (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 0-7803-7872-5 (literal)
Abstract
  • For the first time, memory devices with optimized high density (2E12#/cm/sup 2/) LPCVD Si nanocrystals have been reproducibly achieved and studied on an extensive statistical basis (from single cell up to 1 Mb test-array) under different programming conditions. An original experimental and theoretical analysis of the threshold voltage shift distribution shows that Si nanocrystals have serious potential to push the scaling of NOR and NAND flash at least to the 35 nm and 65 nm nodes, respectively. (literal)
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