http://www.cnr.it/ontology/cnr/individuo/prodotto/ID167963

Low-temperature PECVD of transparent SiOxCyHz thin films (Articolo in rivista)

Type

Articolo in rivista (Classe)
Prodotto della ricerca (Classe)

Label

Low-temperature PECVD of transparent SiOxCyHz thin films (Articolo in rivista) (literal)

Anno

2007-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

10.1002/cvde.200606518 (literal)

Alternative label

Davide Barreca; Alberto Gasparotto; Chiara Maccato; Cinzia Maragno; Eugenio Tondello; Gilberto Rossetto (2007)
Low-temperature PECVD of transparent SiOxCyHz thin films
in Chemical vapor deposition (Print); WILEY-V C H VERLAG GMBH, WEINHEIM (Germania)
(literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

Davide Barreca; Alberto Gasparotto; Chiara Maccato; Cinzia Maragno; Eugenio Tondello; Gilberto Rossetto (literal)

Pagina inizio

205 (literal)

Pagina fine

210 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

http://onlinelibrary.wiley.com/doi/10.1002/cvde.200606518/abstract (literal)

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13 (literal)

Rivista

Chemical vapor deposition (Rivista)

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6 (literal)

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5 (literal)

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The present work was focused on the PECVD synthesis of SiOxCyHz thin films from Ar/TMOS plasmas in the absence of oxidizing compounds at close to room temperature. The obtained layers consist of a compact amorphous inorganic/organic silica-like material, presenting a good adhesion to substrates, sharp interfaces, good hardness, and a remarkably high spectral transparency. Taken together, these results indicate that the adopted route is a valuable alternative for the deposition of such coatings under mild processing conditions. These aspects have relevant applicative importance for the development of anti-wear and barrier coatings against the oxidation of metallic substrates. To this aim, future developments of the present work will concern a more detailed insight into the film mechanical properties and protective performances. (literal)

Note

ISI Web of Science (WOS) (literal)
Scopu (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

ISTM - CNR Padova / Dip. di Chimica, Università di Padova / Dip. di Chimica, Università di Padova / Dip. di Chimica, Università di Padova / Dip. di Chimica, Università di Padova / ICIS - CNR - Padova (literal)

Titolo

Low-temperature PECVD of transparent SiOxCyHz thin films (literal)

Abstract

Hybrid organic/inorganic SiOxCyHz thin films are prepared on Cu, Si(100), and SiO2 substrates by plasma-enhanced (PE)CVD using tetramethoxysilane (TMOS) as the precursor compound. Depositions are performed from Ar plasmas at temperatures as low as 60 °C, avoiding the use of oxidizing reagents in view of possible film application as protective coatings against substrate oxidation. In situ monitoring of deposition processes is performed using laser reflection interferometry (LRI), which provides valuable information on the growth rate as a function of the adopted synthesis conditions. The obtained film thickness values are confirmed by scanning electron microscopy (SEM), which is also used to investigate the film morphology and its adhesion to the substrate. The chemical structure and composition are investigated in detail by a combined use of energy dispersive X-ray spectroscopy (EDX), Fourier transform infrared (FTIR) spectroscopy, and X-ray photoelectron spectroscopy (XPS). Glancing incidence X-ray diffraction (GIXRD) and UV-vis spectroscopy are used for the study of the structural and optical properties of the system. Finally, nanoindentation measurements permit the evaluation of the hardness of the synthesized coatings. Amorphous layers with a silica-like network incorporating covalently bonded methyl and methoxy groups are obtained under very mild synthesis conditions. Furthermore, the coatings are characterized by good substrate conformal coverage and remarkable optical transparency. (literal)

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