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Dielectric constant boost in amorphous sesquioxides (Articolo in rivista)
- Type
- Label
- Dielectric constant boost in amorphous sesquioxides (Articolo in rivista) (literal)
- Anno
- 2008-01-01T00:00:00+01:00 (literal)
- Alternative label
Delugas, P; Fiorentini, V; Filippetti, A (2008)
Dielectric constant boost in amorphous sesquioxides
in Applied physics letters
(literal)
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- Delugas, P; Fiorentini, V; Filippetti, A (literal)
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- \"[Delugas, Pietro; Fiorentini, Vincenzo] NXP Semicond, B-3001 Louvain, Belgium; [Delugas, Pietro] CNR, IMM, I-95123 Cagliari, Italy; [Fiorentini, Vincenzo; Filippetti, Alessio] CNR, INFM, SLACS, I-09100 Cagliari, Italy; [Fiorentini, Vincenzo; Filippetti, Alessio] Univ Cagliari, Dipartimento Fis, I-09042 Sardinia, Italy (literal)
- Titolo
- Dielectric constant boost in amorphous sesquioxides (literal)
- Abstract
- High-kappa dielectrics for insulating layers are a current key ingredient of microelectronics. X2O3 sesquioxide compounds are among the candidates. Here, we show for a typical material of this class, Sc2O3, that the relatively modest dielectric constant of its crystalline phase is enhanced in the amorphous phase by over 40% (from similar to 15 to similar to 22). This is due to the disorder-induced activation of low frequency cation-related modes which are inactive or inefficient in the crystal and by the conservation of effective dynamical charges (a measure of atomic polarizability). The analysis employs density-functional energy-force and perturbation-theory calculations of the dielectric response of amorphous samples generated by pair-potential molecular dynamics. (C) 2008 American Institute of Physics. (literal)
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