EIS study of niobium films sputtered at different target-substrate angles (Articolo in rivista)

Type
Label
  • EIS study of niobium films sputtered at different target-substrate angles (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.electacta.2005.02.126 (literal)
Alternative label
  • S. Cattarin; M. Musiani; V. Palmieri; D.Tonini (2006)
    EIS study of niobium films sputtered at different target-substrate angles
    in Electrochimica acta
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • S. Cattarin; M. Musiani; V. Palmieri; D.Tonini (literal)
Pagina inizio
  • 1745 (literal)
Pagina fine
  • 1751 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.sciencedirect.com/science/article/pii/S001346860500825X (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 51 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1-2 : CNR, Istituto per l' Energetica e le Interfasi, I-35127 Padova, Italy / 3-4 : Ist Nazl Fis Nucl, Lab Nazl Legnaro, I-35020 Legnaro, Italy; INFM, UdR Padova, I-35131 Padua, Italy (literal)
Titolo
  • EIS study of niobium films sputtered at different target-substrate angles (literal)
Abstract
  • Nb films have been magnetron Sputtered onto quartz sheets oriented with respect to the target at angles varying between 0 degrees and 90 degrees, with 15 degrees steps. Impedance plots have been obtained by contacting these films with aqueous Na2SO4, either at the open circuit potential or at a potential where Nb is covered by an anodic passive Nb2O5 film. As the target-substrate angle theta increases, the shape of the impedance plots changes from that of a smooth electrode to that of a porous one, characterised in the high frequency range by a straight line forming a 45 degrees angle with the real axis. The surface roughness of the Nb deposits, calculated from their double layer capacity, is low and constant at low theta, significantly increases at theta=45 degrees, goes through a maximum in the range 60-75 degrees and drops at theta=90 degrees. AFM surface profiling confirms this trend, but estimates a lower surface roughness. Attempts to obtain Nb deposits with a surface roughness less strongly dependent on theta have been made by performing the depositions under pulsed conditions or by heating the substrates at 400-600 degrees C. Heating at the higher temperature was a fairly effective method for decreasing the roughness of deposits formed at large theta. (c) 2005 Elsevier Ltd. All rights reserved. (literal)
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