http://www.cnr.it/ontology/cnr/individuo/prodotto/ID1404
High throughput electron beam lithography on insulating substrates for photonic devices (Articolo in rivista)
- Type
- Label
- High throughput electron beam lithography on insulating substrates for photonic devices (Articolo in rivista) (literal)
- Anno
- 2007-01-01T00:00:00+01:00 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Salerno, M; Cingolani, R (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR, INFM, NNL, I-73100 Lecce, Italy (literal)
- Titolo
- High throughput electron beam lithography on insulating substrates for photonic devices (literal)
- Abstract
- We have developed an all-polymer procedure for sub-microscale large area patterning of fused silica plates based on electron beam lithography. The procedure relies on the use of a high sensitivity resist, negative tone epoxy-based SU-8 and a conducting polymer, a doped PDOT, as the electron discharge layer. The chemically amplified resist SU-8 allows for a five-fold increase in exposure speed as compared to standard PMMA, and the PDOT layer makes it possible to avoid the time-consuming deposition of a metallic layer and its critical removal. Gratings of stripes and pillars, possibly useful for the realization of photonic devices, are demonstrated. (literal)
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