High throughput electron beam lithography on insulating substrates for photonic devices (Articolo in rivista)

Type
Label
  • High throughput electron beam lithography on insulating substrates for photonic devices (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • Salerno, M; Cingolani, R (2007)
    High throughput electron beam lithography on insulating substrates for photonic devices
    in Journal of micromechanics and microengineering (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Salerno, M; Cingolani, R (literal)
Pagina inizio
  • 2414 (literal)
Pagina fine
  • 2419 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 17 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, INFM, NNL, I-73100 Lecce, Italy (literal)
Titolo
  • High throughput electron beam lithography on insulating substrates for photonic devices (literal)
Abstract
  • We have developed an all-polymer procedure for sub-microscale large area patterning of fused silica plates based on electron beam lithography. The procedure relies on the use of a high sensitivity resist, negative tone epoxy-based SU-8 and a conducting polymer, a doped PDOT, as the electron discharge layer. The chemically amplified resist SU-8 allows for a five-fold increase in exposure speed as compared to standard PMMA, and the PDOT layer makes it possible to avoid the time-consuming deposition of a metallic layer and its critical removal. Gratings of stripes and pillars, possibly useful for the realization of photonic devices, are demonstrated. (literal)
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