Quasi-epitaxial growth of crystalline wurtzite AlN thin films on Si(001) by RF magnetron sputtering (Contributo in atti di convegno)

Type
Label
  • Quasi-epitaxial growth of crystalline wurtzite AlN thin films on Si(001) by RF magnetron sputtering (Contributo in atti di convegno) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1109/ULTSYM.2009.5441423 (literal)
Alternative label
  • Cinzia Caliendo (1); Patrizia Imperatori (2); Guido Scavia (3) (2009)
    Quasi-epitaxial growth of crystalline wurtzite AlN thin films on Si(001) by RF magnetron sputtering
    in 2009 IEEE International Ultrasonics Symposium (IUS), Rome, September 20-23, 2009
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Cinzia Caliendo (1); Patrizia Imperatori (2); Guido Scavia (3) (literal)
Pagina inizio
  • 1614 (literal)
Pagina fine
  • 1619 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#altreInformazioni
  • In relazione al prodotto , vedere anche Book abstracts, Session Poster P1-O-01, 254 (2009). Monday, Sept. 21 + Session Chair: Caliendo Cinzia P3/K : Thin films-characterizations, Wednesday, Sept. 23 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=5441423 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#volumeInCollana
  • Category number 09CH38141; Code 80324 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • IEEE International Ultrasonic Symposium (IUS), September 20-23, 2009, Rome. Book abstracts, Session Poster P1-O-01, 254 (2009). Monday, Sept. 21 + Session Chair: Caliendo Cinzia P3/K : Thin films-characterizations, Wednesday, Sept. 23. IEEE (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 5441423 (literal)
Note
  • Scopu (literal)
  • SCImago (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • (1) Istituto dei Sistemi Complessi - CNR, Via del Fosso del Cavaliere 100, 00133 Rome-Italy (2) Istituto di [Struttura della Materia] Chimica dei Materiali - CNR, Via Salaria km. 29,300, 00016 Monterotondo (Rome)-Italy (3) Istituto di Chimica delle Macromolecole - CNR, Via Bassini 15, 20133 Milano, Italy (literal)
Titolo
  • Quasi-epitaxial growth of crystalline wurtzite AlN thin films on Si(001) by RF magnetron sputtering (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 978-1-4244-4389-5 (literal)
Abstract
  • Piezoelectric AlN films were grown on Si(001) substrates at 200°C by RF reactive magnetron sputtering technique. The optimization of the sputtering parameters (target-substrate distance, RF power, gas composition) resulted in the quasi-epitaxial growth of crystalline wurtzite AlN thin films. The structure and the morphology of the films were investigated by X-ray diffraction and atomic force microscopy techniques. These measurements showed that the AlN films were highly c-axis oriented, with low surface roughness. The structural and morphological characteristics of the best films were correlated to the gas composition of the optimized sputtering process. The piezoelectric constant d33 of all the sputtered AlN films was measured and a value (15 pC/N) surprisingly much higher than that of the bulk single crystal was estimated for the highest quality AlN film. (literal)
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