Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with femtosecond laser irradiation (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with femtosecond laser irradiation (Articolo in rivista) (literal)

Anno

• 2006-01-01T00:00:00+01:00 (literal)

Alternative label

• Zorba, V; Persano, L; Pisignano, D; Athanassiou, A; Stratakis, E; Cingolani, R; Tzanetakis, P; Fotakis, C (2006)
  Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with femtosecond laser irradiation
  in Nanotechnology (Bristol. Print)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Zorba, V; Persano, L; Pisignano, D; Athanassiou, A; Stratakis, E; Cingolani, R; Tzanetakis, P; Fotakis, C (literal)

Pagina inizio

• 3234 (literal)

Pagina fine

• 3238 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 17 (literal)

Rivista

• Nanotechnology (Rivista)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Fdn Res & Technol Hellas, Inst Elect Struct & Laser, Iraklion 71110, Crete, Greece; Univ Crete, Dept Phys, Iraklion 71003, Greece; CNR, Natl Nanotechnol Lab, Lecce 73100, Italy; Univ Crete, Dept Mat Sci & Technol, Iraklion 71003, Greece (literal)

Titolo

• Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with femtosecond laser irradiation (literal)

Abstract

• We report on the wettability properties of silicon surfaces, simultaneously structured on the micrometre-scale and the nanometre-scale by femtosecond (fs) laser irradiation to render silicon hydrophobic. By varying the laser fluence, it was possible to control the wetting properties of a silicon surface through a systematic and reproducible variation of the surface roughness. In particular, the silicon - water contact angle could be increased from 66 degrees to more than 130 degrees. Such behaviour is described by incomplete liquid penetration within the silicon features, still leaving partially trapped air inside. We also show how controllable design and tailoring of the surface microstructures by wettability gradients can drive the motion of the drop's centre of mass towards a desired direction ( even upwards). (literal)

Prodotto di

• Nanotecnologie della materia soffice (MD.P06.008.002) (Modulo)
• Nanotecnologie molecolari (MD.P06.007.001) (Modulo)
• Nanocompositi (MD.P06.015.001) (Modulo)

Autore CNR

• ROBERTO CINGOLANI (Persona)
• DARIO PISIGNANO (Persona)

Insieme di parole chiave

• Parole chiave di "Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with femtosecond laser irradiation" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• DARIO PISIGNANO (Persona)
• ROBERTO CINGOLANI (Persona)

Prodotto

• Nanocompositi (MD.P06.015.001) (Modulo)
• Nanotecnologie molecolari (MD.P06.007.001) (Modulo)
• Nanotecnologie della materia soffice (MD.P06.008.002) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Nanotechnology (Rivista)

Insieme di parole chiave di

• Parole chiave di "Making silicon hydrophobic: wettability control by two-lengthscale simultaneous patterning with femtosecond laser irradiation" (Insieme di parole chiave)