In situ chemical and structural investigations of the oxidation of Ge(001) substrates by atomic oxygen (Articolo in rivista)

Type
Label
  • In situ chemical and structural investigations of the oxidation of Ge(001) substrates by atomic oxygen (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • Molle, A; Bhuiyan, MNK; Tallarida, G; Fanciulli, M (2006)
    In situ chemical and structural investigations of the oxidation of Ge(001) substrates by atomic oxygen
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Molle, A; Bhuiyan, MNK; Tallarida, G; Fanciulli, M (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 89 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, Lab Nazl MDM, INFM, I-20041 Agrate Brianza, Milano, Italy (literal)
Titolo
  • In situ chemical and structural investigations of the oxidation of Ge(001) substrates by atomic oxygen (literal)
Abstract
  • The exposure of Ge(001) substrates to atomic oxygen was studied in situ to establish the stability of the germanium oxide. After preparing chemically clean and atomically flat Ge(001) surfaces, the Ge samples were exposed to atomic oxygen in a wide temperature range from room temperature to 400 degrees C. The chemical composition of the so-formed oxides was studied by means of x-ray photoelectron spectroscopy, while the structure was observed by reflection high energy electron diffraction. At low substrate temperatures the atomic oxygen is efficiently chemisorbed and suboxides coexist with the dioxide, which in turn is remarkably promoted in the high temperature range. (c) 2006 American Institute of Physics. (literal)
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