Analysis of ion implanted Silicon by RBS-channeling: influence of the damage model. (Abstract/Poster in atti di convegno)

Type
Label
  • Analysis of ion implanted Silicon by RBS-channeling: influence of the damage model. (Abstract/Poster in atti di convegno) (literal)
Anno
  • 2003-01-01T00:00:00+01:00 (literal)
Alternative label
  • M. Bianconi , E. Albertazzi, S. Balboni, G. Lulli. (2003)
    Analysis of ion implanted Silicon by RBS-channeling: influence of the damage model.
    in Ion Beam Analysis (IBA-16), Albuquerque
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M. Bianconi , E. Albertazzi, S. Balboni, G. Lulli. (literal)
Titolo
  • Analysis of ion implanted Silicon by RBS-channeling: influence of the damage model. (literal)
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