Low temperature PECVD of silicon oxynitride thin films from dimethylsilanes: role of oxygen addition (Abstract/Poster in atti di convegno)

Type
Label
  • Low temperature PECVD of silicon oxynitride thin films from dimethylsilanes: role of oxygen addition (Abstract/Poster in atti di convegno) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • R. Di Mundo, F. Fracassi, R. dÂ’Agostino, F. Palumbo (2006)
    Low temperature PECVD of silicon oxynitride thin films from dimethylsilanes: role of oxygen addition
    in AVS 53RD International Symposyum & Exhibition, San Francisco, CA
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • R. Di Mundo, F. Fracassi, R. dÂ’Agostino, F. Palumbo (literal)
Note
  • Abstract (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Department of Chemistry, University of Bari, Bari, Italy IMIP CNR, Bari Italy (literal)
Titolo
  • Low temperature PECVD of silicon oxynitride thin films from dimethylsilanes: role of oxygen addition (literal)
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Autore CNR

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