Er2O3 thin films deposited by MOCVD as a candidate high-K oxide (Abstract/Poster in atti di convegno)

Type
Label
  • Er2O3 thin films deposited by MOCVD as a candidate high-K oxide (Abstract/Poster in atti di convegno) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • M.M. Giangregorio, M. Losurdo, A. Sacchetti, P. Capezzuto, G. Bruno, D. Barreca, E. Tondello, (2006)
    Er2O3 thin films deposited by MOCVD as a candidate high-K oxide
    in SAMIC 2006, Brixen, Italy
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M.M. Giangregorio, M. Losurdo, A. Sacchetti, P. Capezzuto, G. Bruno, D. Barreca, E. Tondello, (literal)
Titolo
  • Er2O3 thin films deposited by MOCVD as a candidate high-K oxide (literal)
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Autore CNR

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