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Plasma-surface interactions in the plasma deposition mechanism of structured Teflon-like coatings (Comunicazione a convegno)

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Plasma-surface interactions in the plasma deposition mechanism of structured Teflon-like coatings (Comunicazione a convegno) (literal)

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Palumbo, Fabio1; Milella, Antonella2; Cicala, Grazia1; Favia, Pietro2; d'Agostino, Riccardo2 (2003)
Plasma-surface interactions in the plasma deposition mechanism of structured Teflon-like coatings
in International Conference on Phenomena in Ionized Gases, Local Organizing Committee, Greifswald, Germany, Greifswald, 15-20 July 2003
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Palumbo, Fabio1; Milella, Antonella2; Cicala, Grazia1; Favia, Pietro2; d'Agostino, Riccardo2 (literal)

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1 Istituto di Metodologie Inorganiche e dei Plasmi - CNR, via Orabona 4, 70126 Bari,(Italy) 2 Dipartimento di Chimica - Università degli Studi di Bari, via Orabona 4, 70126 Bari,(Italy) (literal)

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Plasma-surface interactions in the plasma deposition mechanism of structured Teflon-like coatings (literal)

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Abstract

C2F4 and c-C4F8 fed plasmas have been investigated for the deposition of fluorocarbon coatings. While continuous glow discharges lead to flat films with a moderate fluorine content, modulated plasmas allows for the deposition of highly fluorinated coatings with a varaiable morphology. It is shown that, particularly in the case of tetrafluorethylene, a unique chemical and morphological structure can be obtained and it can be explained with a modified activated growth model mechanism. (literal)

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