Polymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography (Articolo in rivista)

Type
Label
  • Polymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • Mele, E; Di Benedetto, F; Persano, L; Cingolani, R; Pisignano, D (2006)
    Polymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Mele, E; Di Benedetto, F; Persano, L; Cingolani, R; Pisignano, D (literal)
Pagina inizio
  • 807 (literal)
Pagina fine
  • 812 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 24 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Care Of Distretto Tecnol ISUFI, Univ Lecce, CNR, INFM,Natl Nanotechnol Lab, I-73100 Lecce, Italy (literal)
Titolo
  • Polymer to polymer to polymer pattern transfer: Multiple molding for 100 nm scale lithography (literal)
Abstract
  • We demonstrate a multiple molding procedure based on the combination of replica molding, in situ patterning of an ultraviolet curable epoxy resist, micromachining by elastomeric elements, and nanoimprinting lithography. The pattern, with features down to the 100 nm scale, is sequentially transferred to several different polymers, allowing one to realize high-resolution organic molds for imprinting compounds of lower glass-transition temperature. The intimate integration of soft and nanoimprinting lithographies enables a combined, multistep mechanical patterning, which can be very useful for a great range of applications for molecular lithography and devices. (c) 2006 American Vacuum Society. (literal)
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