ION-IMPLANTED SI
- Label
- ION-IMPLANTED SI (literal)
- Membro di
- Parole chiave di "Fluorine incorporation in preamorphized silicon" (Insieme di parole chiave)
- Keywords of "Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion" (Insieme di parole chiave)
- Keywords of "Investigation of fluorine three-dimensional redistribution during solid-phase-epitaxial-regrowth of amorphous Si" (Insieme di parole chiave)
- Keywords of "Defect-induced homogeneous amorphization of silicon: the role of defect structure and population" (Insieme di parole chiave)
- Keywords of "Evidences of F-induced nanobubbles as sink for self-interstitials in Si" (Insieme di parole chiave)
- Value
- ION-IMPLANTED SI (literal)
Incoming links:
- Ha membro
- Keywords of "Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion" (Insieme di parole chiave)
- Keywords of "Defect-induced homogeneous amorphization of silicon: the role of defect structure and population" (Insieme di parole chiave)
- Keywords of "Investigation of fluorine three-dimensional redistribution during solid-phase-epitaxial-regrowth of amorphous Si" (Insieme di parole chiave)
- Keywords of "Evidences of F-induced nanobubbles as sink for self-interstitials in Si" (Insieme di parole chiave)
- Parole chiave di "Fluorine incorporation in preamorphized silicon" (Insieme di parole chiave)