HFO2 FILMS
- Label
- HFO2 FILMS (literal)
- Membro di
- Keywords of "Atomic layer deposition of Lu silicate films using [(Me3Si)(2)N](3)Lu" (Insieme di parole chiave)
- Keywords of "Nondestructive diagnostics of high-kappa dielectrics for advanced electronic devices" (Insieme di parole chiave)
- Parole chiave di "Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism" (Insieme di parole chiave)
- Value
- HFO2 FILMS (literal)
Incoming links:
- Ha membro
- Keywords of "Nondestructive diagnostics of high-kappa dielectrics for advanced electronic devices" (Insieme di parole chiave)
- Keywords of "Atomic layer deposition of Lu silicate films using [(Me3Si)(2)N](3)Lu" (Insieme di parole chiave)
- Parole chiave di "Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism" (Insieme di parole chiave)