Keywords of "Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion"
- Label
- Keywords of "Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion" (literal)
- Parole chiave di "Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion" (literal)
- Insieme di parole chiave di
- Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Ha membro
- AMORPHOUS SILICON LAYERS (Parola chiave)
- TRANSMISSION ELECTRON-MICROSCOPE (Parola chiave)
- TRANSIENT ENHANCED DIFFUSION (Parola chiave)
- ION-IMPLANTED SI (Parola chiave)
- BORON THERMAL-DIFFUSION (Parola chiave)
Incoming links:
- Insieme di parole chiave
- Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Membro di
- TRANSMISSION ELECTRON-MICROSCOPE (Parola chiave)
- TRANSIENT ENHANCED DIFFUSION (Parola chiave)
- ION-IMPLANTED SI (Parola chiave)
- BORON THERMAL-DIFFUSION (Parola chiave)
- AMORPHOUS SILICON LAYERS (Parola chiave)