Parole chiave di "Room-temperature B off-lattice displacement and electrical deactivation induced by H and He implantation"

Label

• Parole chiave di "Room-temperature B off-lattice displacement and electrical deactivation induced by H and He implantation" (literal)
• Keywords of "Room-temperature B off-lattice displacement and electrical deactivation induced by H and He implantation" (literal)

Insieme di parole chiave di

• Room-temperature B off-lattice displacement and electrical deactivation induced by H and He implantation (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Ha membro

• ENHANCED DIFFUSION (Parola chiave)
• BORON (Parola chiave)
• SILICON (Parola chiave)
• SI (Parola chiave)
• DOPANT DIFFUSION (Parola chiave)

Incoming links:

Insieme di parole chiave

• Room-temperature B off-lattice displacement and electrical deactivation induced by H and He implantation (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Membro di

• BORON (Parola chiave)
• SILICON (Parola chiave)
• SI (Parola chiave)
• DOPANT DIFFUSION (Parola chiave)
• ENHANCED DIFFUSION (Parola chiave)