Parole chiave di "Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors"

Label

• Parole chiave di "Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors" (literal)
• Keywords of "Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors" (literal)

Insieme di parole chiave di

• Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Ha membro

• LI-MOCVD (Parola chiave)
• Thin films (Parola chiave)
• Ti-Ta-O (Parola chiave)
• High-k oxides (Parola chiave)
• Precursor chemistry (Parola chiave)

Incoming links:

Insieme di parole chiave

• Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Membro di

• Thin films (Parola chiave)
• High-k oxides (Parola chiave)
• Precursor chemistry (Parola chiave)
• Ti-Ta-O (Parola chiave)
• LI-MOCVD (Parola chiave)