Keywords of "Atomic layer deposition of NiO films on Si(100) using cyclopentadienyl-type compounds and ozone as precursors"

Label

• Keywords of "Atomic layer deposition of NiO films on Si(100) using cyclopentadienyl-type compounds and ozone as precursors" (literal)
• Parole chiave di "Atomic layer deposition of NiO films on Si(100) using cyclopentadienyl-type compounds and ozone as precursors" (literal)

Insieme di parole chiave di

• Atomic layer deposition of NiO films on Si(100) using cyclopentadienyl-type compounds and ozone as precursors (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Ha membro

• WATER (Parola chiave)
• CHEMICAL-VAPOR-DEPOSITION (Parola chiave)
• NICKEL-OXIDE (Parola chiave)
• OXIDE THIN-FILMS (Parola chiave)
• HIGH-TEMPERATURES (Parola chiave)

Incoming links:

Insieme di parole chiave

• Atomic layer deposition of NiO films on Si(100) using cyclopentadienyl-type compounds and ozone as precursors (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Membro di

• WATER (Parola chiave)
• OXIDE THIN-FILMS (Parola chiave)
• NICKEL-OXIDE (Parola chiave)
• CHEMICAL-VAPOR-DEPOSITION (Parola chiave)
• HIGH-TEMPERATURES (Parola chiave)