Keywords of "Interface width evaluation in thin layered CoFeB/MgO multilayers including Ru or Ta buffer layer by X-ray reflectivity"
- Label
- Keywords of "Interface width evaluation in thin layered CoFeB/MgO multilayers including Ru or Ta buffer layer by X-ray reflectivity" (literal)
- Parole chiave di "Interface width evaluation in thin layered CoFeB/MgO multilayers including Ru or Ta buffer layer by X-ray reflectivity" (literal)
- Insieme di parole chiave di
- Ha membro
- X rays (Parola chiave)
- Tantalum (Parola chiave)
- Buffer layers (Parola chiave)
- Cobalt compounds (Parola chiave)
- Ruthenium (Parola chiave)
- X ray reflectivity (Parola chiave)
- Film growth (Parola chiave)
- Ta buffer layers (Parola chiave)
- Interface widths (Parola chiave)
- Specular x-ray reflectivities (Parola chiave)
- Multilayers (Parola chiave)
- Annealing (Parola chiave)
- Anisotropic behaviors (Parola chiave)
- CoFeB/MgO (Parola chiave)
- Perpendicular magnetic anisotropy (Parola chiave)
- Dielectric materials (Parola chiave)
- Magnetic anisotropy (Parola chiave)
- Reproducibilities (Parola chiave)
Incoming links:
- Insieme di parole chiave
- Membro di
- Ruthenium (Parola chiave)
- Tantalum (Parola chiave)
- Multilayers (Parola chiave)
- Magnetic anisotropy (Parola chiave)
- X ray reflectivity (Parola chiave)
- Reproducibilities (Parola chiave)
- X rays (Parola chiave)
- Buffer layers (Parola chiave)
- Cobalt compounds (Parola chiave)
- Film growth (Parola chiave)
- Ta buffer layers (Parola chiave)
- Interface widths (Parola chiave)
- Specular x-ray reflectivities (Parola chiave)
- Annealing (Parola chiave)
- Anisotropic behaviors (Parola chiave)
- CoFeB/MgO (Parola chiave)
- Perpendicular magnetic anisotropy (Parola chiave)
- Dielectric materials (Parola chiave)
