Parole chiave di "Chemical vapor deposition growth of Fe3O4 thin films and Fe/Fe3O4 bi-layers for their integration in magnetic tunnel junctions"
- Label
- Parole chiave di "Chemical vapor deposition growth of Fe3O4 thin films and Fe/Fe3O4 bi-layers for their integration in magnetic tunnel junctions" (literal)
- Keywords of "Chemical vapor deposition growth of Fe3O4 thin films and Fe/Fe3O4 bi-layers for their integration in magnetic tunnel junctions" (literal)
- Insieme di parole chiave di
- Ha membro
- Atomic layer (Parola chiave)
- Magnetic devices (Parola chiave)
- In-situ (Parola chiave)
- Fe3O4 (Parola chiave)
- Raman scattering (Parola chiave)
- Deposition pressures (Parola chiave)
- Vapors (Parola chiave)
- Thin films (Parola chiave)
- Tri-iron dodecarbonyl (Parola chiave)
- Chemical vapor deposition process (Parola chiave)
- Bilayer (Parola chiave)
- X ray diffraction (Parola chiave)
- Iron (Parola chiave)
- Secondary ion mass spectrometry (Parola chiave)
- Chemical vapor deposition (Parola chiave)
- X ray reflectivity (Parola chiave)
- Magnetic tunnel junction (Parola chiave)
- Time of flight secondary ion mass spectrometry (Parola chiave)
- Raman spectroscopy (Parola chiave)
Incoming links:
- Insieme di parole chiave
- Membro di
- Raman spectroscopy (Parola chiave)
- Thin films (Parola chiave)
- X ray diffraction (Parola chiave)
- Tri-iron dodecarbonyl (Parola chiave)
- Chemical vapor deposition process (Parola chiave)
- Bilayer (Parola chiave)
- Iron (Parola chiave)
- Deposition pressures (Parola chiave)
- Vapors (Parola chiave)
- Chemical vapor deposition (Parola chiave)
- Atomic layer (Parola chiave)
- Magnetic devices (Parola chiave)
- In-situ (Parola chiave)
- Fe3O4 (Parola chiave)
- Raman scattering (Parola chiave)
- Secondary ion mass spectrometry (Parola chiave)
- X ray reflectivity (Parola chiave)
- Magnetic tunnel junction (Parola chiave)
- Time of flight secondary ion mass spectrometry (Parola chiave)
