Keywords of "Ion Implanted p(+)/n diodes: post-implantation annealing in a silane ambient in a cold-wall low-pressure CVD reactor"
- Label
- Keywords of "Ion Implanted p(+)/n diodes: post-implantation annealing in a silane ambient in a cold-wall low-pressure CVD reactor" (literal)
- Parole chiave di "Ion Implanted p(+)/n diodes: post-implantation annealing in a silane ambient in a cold-wall low-pressure CVD reactor" (literal)
- Insieme di parole chiave di
- Ion Implanted p(+)/n diodes: post-implantation annealing in a silane ambient in a cold-wall low-pressure CVD reactor (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Ha membro
- p(+)/n junction diode (Parola chiave)
- 4H-SIC DIODES (Parola chiave)
- 1600-DEGREES-C (Parola chiave)
- J-V CHARACTERISTICS (Parola chiave)
- post implantation annealing (Parola chiave)
- silane (Parola chiave)
- AFM (Parola chiave)
- ion Implantation (Parola chiave)
Incoming links:
- Insieme di parole chiave
- Ion Implanted p(+)/n diodes: post-implantation annealing in a silane ambient in a cold-wall low-pressure CVD reactor (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Membro di
- AFM (Parola chiave)
- post implantation annealing (Parola chiave)
- silane (Parola chiave)
- ion Implantation (Parola chiave)
- J-V CHARACTERISTICS (Parola chiave)
- 1600-DEGREES-C (Parola chiave)
- p(+)/n junction diode (Parola chiave)
- 4H-SIC DIODES (Parola chiave)
