Keywords of "Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications"

Label

• Keywords of "Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications" (literal)
• Parole chiave di "Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications" (literal)

Insieme di parole chiave di

• Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications (Articolo in rivista) (Prodotto della ricerca)

Ha membro

• ZRO2 THIN-FILMS (Parola chiave)
• ALTERNATIVE GATE DIELECTRICS (Parola chiave)
• SITU REACTION-MECHANISM (Parola chiave)
• LANTHANUM-ALUMINATE (Parola chiave)
• HIGH-K DIELECTRICS (Parola chiave)

Incoming links:

Insieme di parole chiave

• Atomic layer deposition of rare-earth-based binary and ternary oxides for microelectronic applications (Articolo in rivista) (Prodotto della ricerca)

Membro di

• SITU REACTION-MECHANISM (Parola chiave)
• ZRO2 THIN-FILMS (Parola chiave)
• LANTHANUM-ALUMINATE (Parola chiave)
• ALTERNATIVE GATE DIELECTRICS (Parola chiave)
• HIGH-K DIELECTRICS (Parola chiave)